Author Index of Volume 304 Serra, A. 339 Tada, M Van Dijk, K. 191 Xu, Serrini, P. 113 Taga, Y Varela, M. 225 Shi, Z. 1710 Takai, O. 18 3 Vasasnaenlel i, I 3% ” Yang. H-Y. 37! Shih, H.-J. 201 Taki, Y. 183 Vassilev, V. 315 es Siciliano, P. 339 Tang, C.C. 170 Veerrt hoeven 1 1i‘9 1 Yang, P.-K. 299 Smilgys, R.V. 303 Taoudi, H. 48 Yoo“ n, K.H. 85 Sokolowski, S. 344 Toméik, B. 136 Song, S.K. 85 Touihri, S. 16 Wang, C.D. 278 Zhai, X. 327 Suder, S. 157 Trehokt, C. 212 Wang, P.W. 160 Zhang, L. 13 Sulak, J. 160 Traverse, A. 113 Weber, B. 98 Zhang, L.P. 160 Sulpice, A. 319 Irtik, V. 225 Welch, W. 245 Zhang, Y. 386 Sung, M.C. 85 Isai, J.-H. 201 Willett, G.D. 130 Zhang, Z. 196 Suzuki, M. 333 Wu, H.-S. 299 Zhu, J. 386 ELma SEAAYV IER Thin Solid Films 304 (1997) 394—399 Subject Index of Volume 304 Adhesion An X-ray diffraction (XRD) study of vapor deposited gold thin films Studies on chemically deposited cadmium sulphoselenide (CdSSe) on aluminum nitride (AIN) substrates, 229 films, 56 Advanced solar reflector “eramics Optical performance and durability of solar reflectors protected by an Study of the influence of oxygen on the composition of thin films alumina coating, 303 obtained by r.f. sputtering from a Ca.(PO,),OH target, 191 AFM ‘halcogens Growth phenomena of Bi,Sr,CaCu,O,,, thin films deposited on Lateral self-diffusion of selenium in CulnSe, thin films, 365 (110) oriented SrTiO, substrates, 212 ‘hemical bath deposition Alumina Studies on chemically deposited cadmium sulphoselenide (CdSSe) Optical performance and durability of solar reflectors protected by an films, 56 alumina coating, 303 “*hemical vapor deposition Aluminium nitride Chemical vapor deposition of Al,O, films using highly volatile single Nanostructure and local chemical composition of AIN—Si,N, layers sourc- es, 22e 2e2] grown by LPCVD, 256 ‘hemical vapor deposition (CVD) Aluminium oxide Three-dimensional morphological instabilities in chemical vapor de Nanoindentation of amorphous aluminum oxide films. III. The influ position films, 371 ence of the substrate on the elastic properties, 70 ‘hemical vapour deposition Aluminum nitride (AIN) substrate Characterization of electron cyclotron resonance source plasma for An X-ray diffraction (XRD) study of vapor deposited gold thin films etching and deposition, 294 on aluminum nitride (AIN) substrates, 229 Deposition of LiTaO, thin films by pyrosol process, 239 Aluminum oxide Iteratively derived optical constants of MoO, polycrystalline thin Chemical vapor deposition of Al,O, films using highly volatile single films prepared by CVD, 39 sources, 222 Two-component phthalocyanine films: impedance study, 36 Amorphous hydrogenated carbon ‘hemical vapour deposition (CVD) Laser-ablation Fourier-transform mass spectrometry of films based on Initial growth phase of diamond thin films observed by thermal amorphous hydrogenated carbon, 130 emission spectrometry, 98 Amorphous materials ‘leavage Electrode limited currents in amorphous Ge—S—Ga thin films, 315 Thin solid film sample preparation by a small-angle cleavage Atomic force microscopy (AFM) transmission electron microscopy, 157 Molecular structure of dipalmitoylphosphatidylcholine Langmuir oatings Blodgett monolayers studied by atomic force microscopy, 327 4 simple in-situ optical film thickness monitor for infrared coatings Atomic hydrogen 24 ITO surface ball formation induced by atomic hydrogen in PECVD obalt and HW-CVD tools, 123 Durable giant magnetoresistive sensors using Co/Cu superlattices Atomic oxygen 333 Plasma etching and patterning of CVD diamond at < 100°C for onductivity microelectronics applications, 245 Electrode limited currents in amorphous Ge—S—Ga thin films, 315 Avalanche multiplication Magnetoresistance of granular ferromagnet—insulator films, 319 Regenerative switching phenomenon of a graded Al Ga,_ . As/In ‘onfinement effect GaAs /GaAs heterostructure, 201 Regenerative switching phenomenon of a graded Al Ga As /In Band structure GaAs /GaAs heterostructure, 201 Electrode limited currents in amorphous Ge—S—Ga thin films, 315 ontacts Barrier lowering effect High aspect ratio contacts: A review of the current tungsten plug Regenerative switching phenomenon of a graded Al Ga,_,As/In process, ] GaAs /GaAs heterostructure, 201 opper BiSrCaCuO Durable giant magnetoresistive sensors using Co/Cu superlattices Growth phenomena of Bi,Sr,CaCu,O,,; thin films deposited on 333 (110) oriented SrTiO, substrates, 212 ‘rystallisation Carbon Crystallisation of thin anatase coatings on muscovite, 204 Shielded arc ion plating and structural characterization of amorphous ‘rystal orientation carbon nitride thin films, 183 Growth phenomena of Bi,Sr,CaCu,O, , ry thin films deposited on (110) oriented SrTiO, substrates, 212 Elsevier Science S.A Subject Index of Volume 304 Cyclotron resonance studies FeCo coatings Characterization of electron cyclotron resonance source plasma Effect of microstructure on the wear behaviour of Fe Co thin films etching and deposition, 294 6 Defects Ferromagnet—insulator mixture films An oXn- raayl umdiifnfurmac tinoint ri(deX R(DA)I N)s tudsyu bstofr atveasp or 2> 2d9e posited gold thin fils THs FilmsM agnetoresistance of granular ferromagnet—insulator films 319 Deposition process Metal—organic vapor deposition of YSZ electrolyte layers for solid Deposition of LiTaO thin films by pyrosol process, 239 oxide fuel cell applications, 106 Effects of wavelength, deposition rate and thickness on laser ablation Fourier—transform mass spectrometry leposited YSZ films on Si( 100), 225 Laser-ablation Fourier-transform mass spectrometry of films based on Electrode limited currents in amorphous Ge—S—Ga thin films, 315 amorphous hydrogenated carbon, 130 Study of the influence of oxygen on the composition of thin film Gas sensors obtained by r.f. sputtering from a Ca.(PO,),OH target 191 Properties and mechanism study of Ag doped SnO, thin films as H,S The characterization of undoped SnO,. thin film grown by reactive , sensors, 13 ion-assisted deposition RS Giant magnetoresistance Depth profiling Magnetoresistance of granular ferromagnet—insulator films 319 Chemical vapor deposition of Al ,O films using highly volatile single Goid film sources, io22 2i e) An X-ray diffraction (XRD) study of vapor deposited gold thin films Diamond m aluminum nitride (AIN) substrates 229 Axial distribution of emission and rate of deposition of diamond-like Growth mechanism film in r.f. discharges in CH,, 136 \ ace EXAFS study of thin nickel deposits on (110) TiO Initial growth phase of diamond thin films observed by thermal surfaces 26 emission spectrometry 98 Initial growth phase of diamond thin films observed by thermal PEELS and EXELFS characterization of diamond films grown by the mis spectrometry OS HF-CVD technique on non-scratched Si substrates, 45 Hardness Plasma etching and patterning of CVD diamond at 100°C for Shielded arc ion plating and structural characterization of amorphous microelectronics applications 45 carbon nitride thin films, 183 Diffusion High-resolution electron microscopy Lateral self-diffusion of selenium in CulnSe, thin films, 365 Nanostructure and local chemical composition of AIN—Si,N layers Three-dimensional morphological instabilities in chemical vapor de grown by LPCVD, 256 position films 4 i HRTEM Doping Growth phenomena of Bi,Sr,CaCu,0, thin films deposited on Interdiffusion in CoN /CN soft X-ray multilayer mirrors ) oriented SrTiO substrates 212 Elastic deformations Hydroge sulphide \ ‘hydrostatic core’ model of elastic deformations in an indented Properties and mechanism study of Ag doped SnO, thin films as H,S film substrate system 8 ensors, 13 Elastic properties Indium tin ox ide Nanoindentation of amorphous aluminum oxide films. III. The influ ITO surface ball formation induced by atomic hydrogen in PECVD ence of the substrate on the elastic properties, 70 and HW-CVD tools, 123 5 Electrical properties and measurements Infrared film thickness monitor Magnetoresistance of granular ferromagnet insulator films 319 \ simple n-situ optical film thickness monitor for infrared coatings Electrochemical characteristics 4 Electrochemical and optical characteristics of conducting poly( Interdiffusivity toluidine) films 65 Interdiffusion in CoN /CN soft X-ray multilayer mirrors Electrochemistry lodine Optical and electrochemical characteristics of sol-gel deposited tung Comparison of the properties of iodine-doped poly( N-vinylcarbazole) sten oxide films: a comparison 310 (PVK) thin films obtained by evaporation of pure powder fol Electron energy loss spectroscopy we DY iodine post-deposition doping and iodine pre-doped Nanostructure and local chemical composition of AIN—Si,N layers powder, 16 grown by LPCVD 2> 56 lon-beam-assisted deposition (IBAD) PEELS and EXELFS characterization of diamond films grown by the Optical performance and durability of solar reflectors protected by an HF-CVD technique on non-scratched Si substrates, 45 alumina coating, 303 Electron spectroscopy lon implantation Tantalum plasma etching with minimum effect on underlying nickel Transmission electron microscopic studies of ternary FeNi—silicide iron thin film, 381 layers prepared by metal vapour vacuum arc ion implantation, 196 Ellipsometry lon plating Optical and electrochemical characteristics of sol—gel deposited tung Shielded arc ion plating and structural characterization of amorphous sten oxide films a comparison 310 carbon nitride thin films, 183 Epitaxy Langmuir—Blodgett films (LB films) Effects of wavelength, deposition rate and thickness on laser ablation Preparation and structure of lanthanum stearate films 23 3 deposited YSZ films on Si( 100), 225 Langmuir-Blodgett films (LB films) Texture development of evaporated nickel films on molybdenum Molecular structure of dipalmitoylphosphatidylcholine Langmuir substrates, 170 Blodgett monolayers studied by atomic force microscopy, 327 Etching Laser ablation Characterization of electron cyclotron resonance source plasma for Effects of wavelength, deposition rate and thickness on laser ablation etching and deposition, 294 deposited YSZ films on Si( 100), 225 396 Subject Index of Volume 304 Laser irradiation Nanostructures Changes in photoluminescence behaviour and structure of porous Changes in photoluminescence behaviour and structure of porous silicon related to preparation conditions and laser irradiation, 358 silicon related to preparation conditions and laser irradiation, 358 Luminescence Negative differential resistance (NDR) Changes in photoluminescence behaviour and structure of porous Regenerative switching phenomenon of a graded Al Ga As /In silicon related to preparation conditions and laser irradiation, 358 GaAs /GaAs heterostructure, 201 Quantum size effect does not yield photoluminescence in nanometer Nichrome alloy silicon crystals, 353 Study of a polycrystalline Ni/Cr alloy V. Hydrogen-atom exposure Magnetic properties and measurements 73 Growth, structural characteristics and magnetoresistance in La—Ca Nickel Mn-—O thin films prepared by dc magnetron sputtering, 386 \ surface EXAFS study of thin nickel deposits on (110) TiO Magnetoresistance of granular ferromagnet—insulator films, 319 surfaces, 267 Mean-field Texture development of evaporated nickel films on molybdenum Monte-Carlo simulation of mixed multilayer adsorption, 344 substrates, 170 Metallization Nitride High aspect ratio contacts: A review of the current tungsten plug Shielded arc ion plating and structural characterization of amorphous process, | carbon nitride thin films, 183 Methane Nitrides Axial distribution of emission and rate of deposition of diamond-like An XRD study of highly textured HfN films, 286 film in r.f. discharges in CH,, 136 Optical characteristics Mg Electrochemical and optical characteristics of conducting poly(o Preparation and characterization of MgF, thin film by a trifluoroacetic toluidine) films, 65 acid method, 252 Optical properties Mica 4 simple in-situ optical film thickness monitor for infrared coatings Crystallisation of thin anatase coatings on muscovite, 204 24 Microstructure Iteratively derived optical constants of MoO, polycrystalline thin Effect of microstructure on the wear behaviour of Fe—Co thin films films prepared by CVD, 39 61 Optical and electrochemical characteristics of sol—gel deposited tung Preparation and characterization of MgF, thin film by a trifluoroacetic sten oxide films: a comparison, 310 acid method, 252 Structural and optical properties of amorphous hydrogenated fluori Microwave plasma nated carbon films produced by PECVD, 149 Plasma etching and patterning of CVD diamond at < 100°C for Optical spectroscopy microelectronics applications, 245 Axial distribution of emission and rate of deposition of diamond-like MOCVD film in r.f. discharges in CH,, 136 Metal—organic vapor deposition of YSZ electrolyte layers for solid Initial growth phase of diamond thin films observed by thermal oxide fuel cell applications, 106 emission spectrometry, 98 MOCVD process Structural and optical properties of amorphous hydrogenated fluori Synthesis and characterization of organometallic precursors for the nated carbon films produced by PECVD, 149 preparation of Sn /chalcogenide heterostructures, 144 Organic substances Molecular beam deposition Preparation and structure of lanthanum stearate films Thin pyrite (FeS,) films by molecular beam deposition, 178 Organometallic precursors Molecular orientation Synthesis and characterization of organometallic precursors for the Determination of the orientation of CuPc film by Raman spec preparation of Sn /chalcogenide heterostructures, 144 troscopy, 166 Organometallic vapor deposition Molybdenum oxide Chemical vapor deposition of Al,O, films using highly volatile single Iteratively derived optical constants of MoO, polycrystalline thin sources, 222 films prepared by CVD, 39 Oxides Monolayers Iteratively derived optical constants of MoO, polycrystalline thin Molecular structure of dipalmitoylphosphatidylcholine Langmuir films prepared by CVD, 39 Blodgett monolayers studied by atomic force microscopy, 327 Oxygen Monte-Carlo simulation Study of the influence of oxygen on the composition of thin films Monte-Carlo simulation of mixed multilayer adsorption, 344 obtained by r.f. sputtering from a Ca.(PO,),OH target, 191 Multilayer PECVD Monte-Carlo simulation of mixed multilayer adsorption, 344 ITO surface ball formation induced by atomic hydrogen in PECVD Multilayers and HW-CVD tools, 123 Durable giant magnetoresistive sensors using Co/Cu superlattices, Phase transitions 333 Transmission electron microscopic studies of ternary FeNi-—silicide Interdiffusion in CoN /CN soft X-ray multilayer mirrors, 278 layers prepared by metal vapour vacuum arc ion implantation, 196 Preparation and structure of lanthanum stearate films, 323 Physical vapour deposition (PVD) Nanoindentation Texture development of evaporated nickel films on molybdenum A ‘hydrostatic core’ model of elastic deformations in an indented substrates, 170 film /substrate system, 78 Plasma etching Nanoindentation of amorphous aluminum oxide films. II. The influ Plasma etching and patterning of CVD diamond at < 100°C for ence of the substrate on the elastic properties, 70 microelectronics applications, 245 Nanostructure Plasma processing and deposition Quantum size effect does not yield photoluminescence in nanometer Axial distribution of emission and rate of deposition of diamond-like silicon crystals, 353 film in r.f. discharges in CH,, 136 Subject Index of Volume 304 Characterization of electron cyclotron resonance source plasma for Silicon nitride etching and deposition, 294 Nanostructure and local chemical composition of AIN—Si,N, layers Structural and optical properties of amorphous hydrogenated fluori grown by LPCVD, 256 nated carbon films produced by PECVD, 149 Single crystal diamond etching Polycarbozole Plasma etching and patterning of CVD diamond at < 100°C fr or Comparison of polycarbazole obtained by oxidation of carbazole microelectronics applications 245 either in solution or in thin film form, 48 Polycrystalline properties of SnO, thin films prepared by the sol Study of a polycrystalline Ni/Cr alloy V. Hydrogen-atom exposure 339 ) ; Thin pyrite (FeS,) films by molecular beam deposition, 178 ganic vapor deposition of YSZ electrolyte layers for solid Polymer thin films oxide fuel cell applications, 106 4 real-time poling approach for preparing second-order nonlinear Soft X-ray optical polymer thin films, 299 Interdiffusion in CoN /CN soft X-ray multilayer mirrors, 278 Post—doping Solar sele e surfaces Comparison of the properties of 1odine-doped poly( N-vinylcarbazole) Laser-ablation Fourier-transform mass spectrometry of films based on (PVK) thin films obtained by evaporation of pure powder fol ous hydrogenated carbon, 130 lowed by iodine post-deposition doping and iodine pre-doped powder, 16 properties of SnO, thin films prepared by the sol—gel Pre—doped powder 449 Comparison of the properties of iodine-doped poly( N-vinylicarbazole) Solutior (PVK) thin films obtained by evaporation of pure powder fol Comparison of polycarbazole obtained by oxidation of carbazole lowed by iodine post-deposition doping and iodine pre-doped itt solution or in thin film form, 48 powder 16 Sputterir Pulsed laser evaparation An XRD study of highly textured HfN films, 286 Growth of CdMnS films by pulsed laser evaporation, 28 Growt! ructural characteristics and magnetoresistance in La—Ca Pyrolysis Mr O thin films prepared by dc magnetron sputtering, 386 Deposition of LiTaO, thin films by pyrosol process, 239 Stud the influence of oxygen on the composition of thin films Quantum well sd by r.f. sputtering from a Ca.(PO,),OH target, 191 Regenerative switching phenomenon of a graded Ga Strain GaAs /GaAs heterostructure, 201 liffraction (XRD) study of vapor deposited gold thin films Radioactive tracer techniques num nitride (AIN) substrates, 229 Lateral self-diffusion of selenium in CulnSe, thin films, 365 Raman scattering tudy of highly textured HfN films, 286 Quantum size effect does not yicn photoluminescence in nanometer silicon crystals, 353 ictural characteristics and magnetoresistance in La—Ca Raman spectroscopy O thin films prepared by dc magnetron sputtering, 386 Determination of the orientation of CuPc film by Raman Superconductor thin film roscopy 166 Growth phenomena of Bi,Sr,CaCu,O, thin films deposited on Regenerative loop feedback oriented SrTiO, substrates Regenerative switching phenomenon tof GaAs /GaAs heterostructure, 20 ymposition and crystalline structure of SnO, thin films Residual stress as sensors, | 13 Effect of microstructure on the wear behaviour » thin film 61 sional morphological instabilities in chemical vapor de Second harmonic generation (SHG) ims. 471 A real-time poling approach preparing second-order nonlinear y optical polymer thin films omposition and crystalline structure of SnO, thin films Segregation as sensors, 113 Lateral self-diffusion of selenium in CulnSe, thin films, 365 nsional morphological instabilities in chemical vapor de Semiconductors films, 371 Properties and mechanism study of loped SnO,, thin films as H,S sensors 3 Molecular structure of dipalmitoylphosphatidyicholine Langmui Sensors tt monolayers studied by atomic force microscopy, 327 Chemical composition and crystalline structure of SnO, thin films Tantalun used aS gas sensors 13 Tantalum plasma etching with minimum effect on underlying nickel Durable giant magnetoresistive sensors using Co /( u superlattice 333 Therma Magnetoresistance of granular ferromagnet—insulator films, 319 X-1 hoton and thermal effects on trimethylsilane covered Sil 100) Two-component phthalocyanine films: impedance study, 36 i 160 Silicides Transmission electron microscopic studies of ternary FeNi-—silicide of polycarbazole obtained by oxidation of carbazole layers prepared by metal vapour vacuum arc ion implantation, 196 solution or in thin film form, 48 Silicon on and characterization of MgF, thin film by a trifluoroacetic Changes in photoluminescence behaviour and structure of porous acid method, 252 silicon related to preparation conditions and laser irradiation, 358 Thin solid films Quantum size effect does not yield photoluminescence in nanometer Thin solid film sample preparation by a small-angle cleavage for silicon crystals, 353 mission electron microscopy, 157 398 Subject Index of Volume 304 Tin oxide Wear Chemical composition and crystalline structure of SnO, thin films Effect of microstructure on the wear behaviour of Fe-—-Co thin films used as gas sensors, 113 6! Properties and mechanism study of Ag doped SnO, thin films as H,S X-ray absorption sensors, 13 A surface EXAFS study of thin nickel deposits on (110) TiO The characterization of undoped SnO, thin film grown by reactive surfaces, 267 ion-assisted deposition, 85 X-ray diffraction Titanium An XRD study of highly textured HfN films, 286 High aspect ratio contacts: A review of the current tungsten plug Crystallisation of thin anatase coatings on muscovite, 204 process, | Deposition of LiTaO, thin films by pyrosol process, 239 Titanium oxide Growth, structural characteristics and magnetoresistance in La—Ca A surface EXAFS study of thin nickel deposits on (110) TiO Mn-—O thin films prepared by dc magnetron sputtering, 386 surfaces, 267 Preparation and structure of lanthanum stearate films, 323 Crystallisation of thin anatase coatings on muscovite, 204 Texture development of evaporated nickel films on molybdenum Transmission electron microscopy (TEM) substrates, 170 An X-ray diffraction (XRD) study of vapor deposited gold thin films X-ray line broadening on aluminum nitride (AIN) substrates, 229 An X-ray diffraction (XRD) study of vapor deposited gold thin films Transmission electron microscopy on aluminum nitride (AIN) substrates, 229 Thin solid film sample preparation by a small-angle cleavage for X-ray photoelectron spectroscopy transmission electron microscopy, 157 Structural and optical properties of amorphous hydrogenated fluori Transmission electron microscopic studies of ternary FeNi-—silicide nated carbon films produced by PECVD, 149 layers prepared by metal vapour vacuum arc ion implantation, 196 X-ray photon Transmittance X-ray photon and thermal effects on trimethylsilane covered Si( 100) Preparation and characterization of MgF, thin film by a trifluoroacetic surfaces, 160 acid method, 252 XRD Trifluoroacetic acid Growth phenomena of Bi,Sr,CaCu,O,,, thin films deposited on Preparation and characterization of MgF, thin film by a trifluoroacetic (110) oriented SrTiO, substrates 212 acid method, 252 [TO surface ball formation induced by atomic hydrogen in PECVD Tungsten and HW-CVD tools, 123 High aspect ratio contacts: A review of the current tungsten plug X-ray diffraction (XRD) process, | Growth of CdMnS films by pulsed laser evaporation, 28 Tungsten oxide YSZ Optical and electrochemical characteristics of sol-gel deposited tung Metal—organic vapor deposition of YSZ electrolyte layers for solid sten oxide films: a comparison, 310 oxide fuel cell applications, 106