ELSEVIER Thin Solid Films 287 (1996) 297 Author Index of Volume 287 Abe, Y., 115 Haemers, J., 104 Man, W.K., 45 Santucci, S., 258 Adachi, S., 51 Hakansson, G., 87 Manabe, K., 184 Sasaki, K., 115 Ai, C.-F., 16 Hess, P., 101 Mantl, S., 93 Savall, C., 154 Albouy, P.-A., 237 Ho, W.-S., 57, 74 Mar, S.Y., 74 Schalch, D., 134 Allain, J., 1 Hofmann, S., 188 Martin, N., 154 Scharmann, A., 134 Hollander, B., 93 Martynenko, Yu., 275 Schiitze, A., 193 Benhenda, S., 87 Howitt, D.G., 214 McCarty, K.F., 214 Sebastian, P.J., 130 Ben-Jacob, E., 36 Huang, Y.S., 74 Medlin, D.L., 214 Sehgal, H.K., 110 Benmassaoud, A.A., 125 Hultman, L., 87, 193, 252 Mencik, J., 208 Seidman, A., 36 Bewilogua, K., 193 Mesters, S., 93 Séverac, C., 146 Binst, L., 25 Ihara, T., 169 Miao, Y.B., 284 Shibata, N., 184 Bliznyuk, V.N., 232 Iriyama, Y., 169 Michelsen, W., 93 Siriwardane, H., 8 Book, G.W., 32 Ivanov, I., 87 Mirkarimi, P.B., 214 Song, H.W., 120 Bouillon, F., 25 Miyazaki, T., 51 Sun, H.-T., 258 Brusatin, G., 65 Jahng, W.S., 220 Moody, N.R., 214 Sundgren, J.-E., 87, 252 Budniok, A., 164 James, W.J., 8 Mori, T., 184 Suréwka, J., 164 Burstein, L., 36 Jark, W., 288 Moscovkin, P., 275 Swain, P.K., 110 Jiang, L., 247 M Theunissen, G.S.A., 193 Szabadi, M., 101 Johansson, M.P., 193 Miiller, B.R., 288 Cantacuzéne, S., 146 Jouve, G., 146 Munz, D., 208 Cantalini, C., 258 Taga, Y., 184 Jung, H.-J., 266 Cardinale, G.F., 214 Tang, J., 247 Carter, G., 275 Narvaez, J., 130 Tiong, K.K., 74 Kacim, S., 25 Carter, W.B., 32 Neher, D., 232 Tomaszewski, H., 104 Kawamura, M., 115 Cedola, A., 288 Newkirk, J.W., 8 Tsukruk, V.V., 232 Kiboku, M., 169 Chau, R.Y., 57 Niedbata, J., 164 Turan, R., 252 Kim, K.-H., 266 Chen, Z., 101 Niessner, W., 134 Kim, N., 220 Choi, D.H., 220 No, K., 120 Valerio, P., 237 Kingon, A.I., 139 Choi, S.S., 271 Vellaikal, M., 139 Kinzler, M., 225 Choi, W.-K., 266 Ohwaki, T., 184 Kitamura, Y., 51 Christmann, T., 134 Otani, Y., 188 Klibanov, L., 36 Wahab, Q., 252 Chu, W.K., 271 Koh, S.-K., 266 Wang, Q., 243 Claudius, J., 225 Palmino, F., 154 Koike, M., 184 Wang, W.H., 293 Clift, W.M., 214 Park, M.J., 271 Kordi Ardakani, H., 280 Wang, W.K., 293 Crecelius, G., 93 Pascova, R., 202 Kouptsidis, S., 193 Weigelt, J., 225 Croitoru, N., 36 Passacantando, M., 258 Kourtev, J., 202 Weinstein, V., 36 Cui, D., 101 Paynter, R.W., 125 Kozaczek, K.J., 32 Wei8mantel, E., 202 Czernuszka, J.T., 174 Peaker, A.J.S., 174 Kunugi, M., 51 Willander, M., 252 Pelino, M., 258 Wohllebe, A., 93 Daaud, S., 193 Pelka, J.B., 288 Lagomarsino, S., 288 Wolfe, J.C., 57 Denanot, M.F., | Pivin, J.C., 65 Lee, J.S., 120 Wong, T.K.S., 45 Denul, J., 104 Polley, T.A., 32 Lee, W.J., 120 Dieker, C., 93 Ponomarev, I.I., 232 Li, B., 247 Di Fonzo, S., 288 Pringle, O.A., 8 Yanagisawa, H., 115 Li, J., 247 Duh, J.G., 80 Yoon, S.F., 284 Li, L., 101 Yu, B.G., 120 Li, X., 247 Quandt, E., 208 Yu, W., 293 Felde, B., 134 Liao, P.C., 74 Licon, D.L., 57 Radhakrishnan, K., 284 Gao, D., 243 Lim, S.J., 220 Reniers, F., 25 Zalczer, G., 65 Gerber, Th., 225 Lin, C.J., 80 Riviere, J.P., 1 Zaytouni, M., | Gierlotka, D., 164 Lin, J.F., 16 Roo, N.D., 104 Zhang, J., 101 Greene, J.E., 87 Ljungcrantz, H., 87 Rosenberg, Yu., 36 Zhang, M., 293 Gryse, R.D., 104 Lozzi, L., 258 Rousselot, C., 154 Zhang, Y., 243 Guu, Y.Y., 16 Liithje, H., 193 Rusman, I., 36 Zhou, Y., 101 Elsevier Science S.A. REieV >.I 5E R Nu Thin Solid Films 287 (1996) 299-303 Subject Index of Volume 287 Adhesion Carbides the tribological characteristics of titanium carbonitride coatings microstructure and physical properties of iron carbide films formed by prepared by cathodic-arc ion plating technique, 16 plasma enhanced chemical vapor deposition, 8 Cu films deposited by a partially ionized beam (PIB), 266 Carbon growth and branching of wrinkles in deposited films, 275 composition and structure of reactively sputter-deposited molybdenum—- Adsorption carbon films., 25 microstructural effect on NO, sensitivity of WO, thin film gas sensors influence of the power and pressure on the growth rate and refractive Part 1. Thin film devices, sensors and actuators, 258 index of a-C:H thin films deposited by r.f. plasma-enhanced Aluminium chemical vapour deposition, 125 plasma polymerization of tetraethoxysilane on aluminum granules for microstructure of BN:C films deposited on Si substrates by reactive corrosion protection, 169 sputtering from a B,C target, 193 Amorphous materials Cathodes microstructure and phase characterization of diamond-like amorphous mechanical characteristics of colored film on stainless steel by the hydrogenated carbon films using STM/STS, 36 current pulse method, 80 influence of the power and pressure on the growth rate and refractive Cathodic arc index of a-C:H thin films deposited by r.f. plasma-enhanced the tribological characteristics of titanium carbonitride coatings chemical vapour deposition, 125 prepared by cathodic-arc ion plating technique, 16 interdiffusion in compositionally modulated amorphous Nb/Si Ceramics multilayers, 293 the effect of electric field on the formation of hydroxyapatite coatings, Anisotropy 174 elastic modulus of TbDyFe films—a comparison of nanoindentation Chemical vapour deposition and bending measurements, 208 preparation of YBa,Cu,O, superconducting thin films via combustion Anodes chemical vapor deposition, 32 mechanical characteristics of colored film on stainless steel by the effects of process parameters on titanium dioxide thin film deposited current pulse method, 80 using ECR MOCVD, 120 Arsenic theoretical study on the fabrication of a microlens using the excimer influence of arsenic in silicon on thermal oxidation rate, 271 laser chemical vapor deposition technique, 243 Atomic force microscopy Coatings scanning probe microscopy and tunnelling measurements of poly- structural characterization of SiC films prepared by dynamic ion crystalline tin oxide films, 45 mixing, 1 Auger electron spectroscopy yttria-stabilized zirconia thin films grown by reactive r.f. magnetron characterization of RuO, thin films deposited on Si by metal-organic sputtering, 104 chemical vapor deposition, 74 XPS study of NbN and (NbTi)N superconducting coatings, 146 changes in surface composition of GaN by impurity doping, 184 the effect of electric field on the formation of hydroxyapatite coatings, high temperature oxidation behaviour of (Ti, _ ,Cr,)N coatings, 188 174 micromachined silicon cantilever beams for thin-film stress elastic modulus of TbDyFe films—a comparison of nanoindentation measurement, 214 and bending measurements, 208 Copper structural study of Langmuir—Blodgett films built from Langmuir Biomaterials mono- and bilayers of a copper phthalocyanine derivative, 237 the effect of electric field on the formation of hydroxyapatite coatings, Cu films deposited by a partially ionized beam (PIB), 266 174 Corrosion Boron carbide plasma polymerization of tetraethoxysilane on aluminum granules for microstructure of BN:C films deposited on Si substrates by reactive corrosion protection, 169 sputtering from a B,C target, 193 Boron nitride microstructure of BN:C films deposited on Si substrates by reactive Deposition process sputtering from a B,C target, 193 microstructure of BN:C films deposited on Si substrates by reactive sputtering from a B,C target, 193 Cadmium sulphide Cu films deposited by a partially ionized beam (PIB), 266 photosensitive ZnCdS nanoparticles in a CdS matrix formed by high Depth profiling temperature sintering of ZnS and CdCl, in argon, 130 high temperature oxidation behaviour of (Ti, _,Cr,)N coatings, 188 Elsevier Science S.A. 300 Subject Index of Volume 287 / Thin Solid Films 287 (1996) 299-303 Diffusion Hardness interdiffusion in compositionally modulated amorphous Nb/ Si arc evaporated Ti-—N films with reduced macroparticle contamination, multilayers, 293 202 Hydrogen Elastic properties microstructure and phase characterization of diamond-like amorphous elastic modulus of TbDyFe films—a comparison of nanoindentation hydrogenated carbon films using STM/STS, 36 and bending measurements, 208 Electrical characterization Indium antimonide electrical and microstructural characterization of lead titanate thin epitaxial growth of InSb films by r.f. magnetron sputtering, 51 films deposited by metal-organic chemical vapor deposition onto Ion bombardment platinum and magnesium oxide, 139 structural characterization of SiC films prepared by dynamic ion Electrical properties and measurements mixing, | characterization of RuO, thin films deposited on Si by metal—organic properties of molecular organo-silicate composites submitted to ion chemical vapor deposition, 74 irradiations, 65 characterization of TiN films prepared by a conventional magnetron growth and branching of wrinkles in deposited films, 275 sputtering system: influence of nitrogen flow percentage and Ion implantation electrical properties, 115 influence of arsenic in silicon on thermal oxidation rate, 271 electrical conductivity of in situ ‘‘hydrogen-reduced’’ and structural lon scattering properties of zinc oxide thin films deposited in different ambients surface diffusion of Fe and island growth of FeSi, on Si(111) by pulsed excimer laser ablation, 280 surfaces, 93 Electrochemistry electrolytic oxygen evolution on Ni-P-Sc,O, composite layers, 164 Langmuir-Blodgett films Electron microscopy investigation of ultra thin Ca/Cd—arachidate films by Grazing structural characterization of SiC films prepared by dynamic ion Incidence Diffraction (GID) with a conventional X-ray tube and a mixing, | synchrotron radiation source, 225 characterization of Pb,Mn, _ ,S thin films prepared by flash evaporation structure—fluorescence properties of some naphthoylene-benzimidazole- technique, 110 based Langmuir—Blodgett films, 232 the effect of electric field on the formation of hydroxyapatite coatings, structural study of Langmuir—Blodgett films built from Langmuir 174 mono- and bilayers of a copper phthalocyanine derivative, 237 Ellipsometry effect of hydroxyl substitution in squaraine dyes on their aggregation epitaxial growth of InSb films by r.f. magnetron sputtering, 51 in Langmuir-Blodgett films, 247 Epitaxy Laser ablation epitaxial growth of InSb films by r.f. magnetron sputtering, 51 effect of oxygen pressure on the orientation, lattice parameters, and ion-assisted low-temperature ( < 150 °C) epitaxial growth of TiN on surface morphology of laser ablated BaTiO, thin films, 101 Cu by reactive magnetron sputter deposition, 87 electrical conductivity of in situ ‘‘hydrogen-reduced’’ and structural Etching properties of zinc oxide thin films deposited in different ambients micromachined silicon cantilever beams for thin-film stress by pulsed excimer laser ablation, 280 measurement, 214 Laser irradiation Evaporation theoretical study on the fabrication of a microlens using the excimer effect of target temperature on the reactive d.c.-sputtering of silicon laser chemical vapor deposition technique, 243 and niobium oxides, 57 Lattice parameters arc evaporated Ti-—N films with reduced macroparticle contamination, effect of oxygen pressure on the orientation, lattice parameters, and 202 surface morphology of laser ablated BaTiO, thin films, 101 Lead titanate Fluorescence electrical and microstructural characterization of lead titanate thin structure—fluorescence properties of some naphthoylene-benzimidazole- films deposited by metal-organic chemical vapor deposition onto based Langmuir-—Blodgett films, 232 platinum and magnesium oxide, 139 electromagnetic field resonance in thin amorphous films: a tool for non- Luminescence destructive localization of thin marker layers by use of a standard some characteristics of silicon-doped Ing 5>Alp.4gAs grown lattice- X-ray tube, 288 matched on InP substrates by molecular beam epitaxy, 284 Gallium arsenide Metal—organic chemical vapour deposition some characteristics of silicon-doped Ing 52Alp 4gAs grown lattice- electrical and microstructural characterization of lead titanate thin matched on InP substrates by molecular beam epitaxy, 284 films deposited by metal-organic chemical vapor deposition onto Glow discharge platinum and magnesium oxide, 139 microstructure and physical properties of iron carbide films formed by Metal-oxide semiconductor structure plasma enhanced chemical vapor deposition, 8 fabrication and characterization of MOS devices on 3C-SiC films Graphite grown by reactive magnetron sputtering on Si(111) substrates, 252 microstructure and phase characterization of diamond-like amorphous Metals hydrogenated carbon films using STM/STS, 36 growth and branching of wrinkles in deposited films, 275 Growth mechanism Microstructural characterization theoretical study on the fabrication of a microlens using the excimer electrical and microstructural characterization of lead titanate thin laser chemical vapor deposition technique, 243 films deposited by metal-organic chemical vapor deposition onto platinum and magnesium oxide, 139 Hall effect Molecular beam epitaxy some characteristics of silicon-doped Ing5 2Alp.4gAs grown lattice- surface diffusion of Fe and island growth of FeSi, on Si(111) matched on InP substrates by molecular beam epitaxy, 284 surfaces, 93 Subject Index of Volume 287 / Thin Solid Films 287 (1996) 299-303 some characteristics of silicon-doped Ing 5>Alp 4gAs grown lattice- Phase transitions matched on InP substrates by molecular beam epitaxy, 284 thermochromic VO, thin films studied by photoelectron spectroscopy, Molybdenum 134 composition and structure of reactively sputter-deposited molybdenum-— Photoconductivity carbon films., 25 photosensitive ZnCdS nanoparticles in a CdS matrix formed by high Monolayers temperature sintering of ZnS and CdCl, in argon, 130 effect of hydroxyl substitution in squaraine dyes on their aggregation Photoelectron spectroscopy in Langmuir—Blodgett films, 247 thermochromic VO, thin films studied by photoelectron spectroscopy, Multilayers 134 investigation of ultra thin Ca/Cd—arachidate films by Grazing Physical vapour deposition Incidence Diffraction (GID) with a conventional X-ray tube and a elastic modulus of TbDyFe films—a comparison of nanoindentation synchrotron radiation source, 225 and bending measurements, 208 electromagnetic field resonance in thin amorphous films: a tool for non- Plasma processing and deposition microstructure and physical properties of iron carbide films formed by destructive localization of thin marker layers by use of a standard plasma enhanced chemical vapor deposition, 8 X-ray tube, 288 effects of process parameters on titanium dioxide thin film deposited interdiffusion in compositionally modulated amorphous Nb/ Si using ECR MOCVD, 120 multilayers, 293 influence of the power and pressure on the growth rate and refractive index of a-C:H thin films deposited by r.f. plasma-enhanced Nickel chemical vapour deposition, 125 electrolytic oxygen evolution on Ni-P—Sc,0, composite layers, 164 plasma polymerization of tetraethoxysilane on aluminum granules for Niobium corrosion protection, 169 XPS study of NbN and (NbTi)N superconducting coatings, 146 Polymers Niobium oxide organically modified sol-gel materials for second-order nonlinear effect of target temperature on the reactive d.c.-sputtering of silicon optics, 220 and niobium oxides, 57 Nitrides Raman scattering XPS study of NbN and (NbTi)N superconducting coatings, 146 characterization of RuO, thin films deposited on Si by metal-organic high temperature oxidation behaviour of (Ti, _,Cr,)N coatings, 188 chemical vapor deposition, 74 Nitrogen dioxide Reflection spectroscopy microstructural effect on NO, sensitivity of WO, thin film gas sensors effect of hydroxyl substitution in squaraine dyes on their aggregation Part 1. Thin film devices, sensors and actuators, 258 in Langmuir—Blodgett films, 247 electromagnetic field resonance in thin amorphous films: a tool for non- destructive localization of thin marker layers by use of a standard Optical coatings X-ray tube, 288 thermochromic VO, thin films studied by photoelectron spectroscopy, Resistivity 134 Cu films deposited by a partially ionized beam (PIB), 266 Optical properties Rutherford backscattering spectroscopy yttria-stabilized zirconia thin films grown by reactive r.f. magnetron influence of arsenic in silicon on thermal oxidation rate, 271 sputtering, 104 characterization of Pb,Mn, _ ,S thin films prepared by flash evaporation Scanning tunnelling microscopy technique, 110 microstructure and phase characterization of diamond-like amorphous influence of the power and pressure on the growth rate and refractive hydrogenated carbon films using STM/STS, 36 index of a-C:H thin films deposited by r.f. plasma-enhanced scanning probe microscopy and tunnelling measurements of poly- chemical vapour deposition, 125 crystalline tin oxide films, 45 characterizations of titanium oxide films prepared by radio frequency Second harmonic generation (SHG) magnetron sputtering, 154 organically modified sol-gel materials for second-order nonlinear Organic substances optics, 220 properties of molecular organo-silicate composites submitted to ion Semiconductors irradiations, 65 characterization of Pb,Mn, _,S thin films prepared by flash evaporation structure—fluorescence properties of some naphthoylene-benzimidazole- technique, 110 based Langmuir-Blodgett films, 232 photosensitive ZnCdS nanoparticles in a CdS matrix formed by high structural study of Langmuir—Blodgett films built from Langmuir temperature sintering of ZnS and CdCl, in argon, 130 mono- and bilayers of a copper phthalocyanine derivative, 237 changes in surface composition of GaN by impurity doping, 184 Organometallic vapour deposition Sensors characterization of RuO, thin films deposited on Si by metal—organic microstructural effect on NO, sensitivity of WO, thin film gas sensors chemical vapor deposition, 74 Part 1. Thin film devices, sensors and actuators, 258 Oxidation Silane high temperature oxidation behaviour of (Ti, _,Cr,)N coatings, 188 organically modified sol-gel materials for second-order nonlinear Oxides optics, 220 yttria-stabilized zirconia thin films grown by reactive r.f. magnetron Silicides sputtering, 104 surface diffusion of Fe and island growth of FeSi, on Si( 111) effects of process parameters on titanium dioxide thin film deposited surfaces, 93 using ECR MOCVD, 120 Silicon Oxygen micromachined silicon cantilever beams for thin-film stress electrolytic oxygen evolution on Ni-P—Sc,O,; composite layers, 164 measurement, 214 302 Subject Index of Volume 287 /T hin Solid Films 287 (1996) 299-303 Silicon carbide effect of hydroxy! substitution in squaraine dyes on their aggregation structural characterization of SiC films prepared by dynamic ion in Langmuir—Blodgett films, 247 mixing, | growth and branching of wrinkles in deposited films, 275 fabrication and characterization of MOS devices on 3C-SiC films Surface structure grown by reactive magnetron sputtering on Si(111) substrates, 252 properties of molecular organo-silicate composites submitted to ion Silicon oxide irradiations, 65 effect of target temperature on the reactive d.c.-sputtering of silicon investigation of ultra thin Ca/Cd—arachidate films by Grazing and niobium oxides, 57 Incidence Diffraction (GID) with a conventional X-ray tube and a organically modified sol-gel materials for second-order nonlinear synchrotron radiation source, 225 optics, 220 influence of arsenic in silicon on thermal oxidation rate, 271 Tin oxide Sintering scanning probe microscopy and tunnelling measurements of poly- photosensitive ZnCdS nanoparticles in a CdS matrix formed by high crystalline tin oxide films, 45 temperature sintering of ZnS and CdCl, in argon, 130 theoretical study on the fabrication of a microlens using the excimer Sputtering laser chemical vapor deposition technique, 243 composition and structure of reactively sputter-deposited molybdenum— Titanium carbonitride carbon films., 25 the tribological characteristics of titanium carbonitride coatings epitaxial growth of InSb films by r.f. magnetron sputtering, 51 prepared by cathodic-arc ion plating technique, 16 Titanium nitride effect of target temperature on the reactive d.c.-sputtering of silicon ion-assisted low-temperature ( < 150 °C) epitaxial growth of TiN on and niobium oxides, 57 Cu by reactive magnetron sputter deposition, 87 ion-assisted low-temperature ( < 150 °C) epitaxial growth of TiN on characterization of TiN films prepared by a conventional magnetron Cu by reactive magnetron sputter deposition, 87 sputtering system: influence of nitrogen flow percentage and characterization of TiN films prepared by a conventional magnetron electrical properties, 115 sputtering system: influence of nitrogen flow percentage and arc evaporated Ti-—N films with reduced macroparticle contamination, electrical properties, 115 202 characterizations of titanium oxide films prepared by radio frequency Titanium oxide magnetron sputtering, 154 characterizations of titanium oxide films prepared by radio frequency microstructure of BN:C films deposited on Si substrates by reactive magnetron sputtering, 154 sputtering from a B,C target, 193 Transmission electron microscopy fabrication and characterization of MOS devices on 3C-SiC films ion-assisted low-temperature ( < 150 °C) epitaxial growth of TiN on grown by reactive magnetron sputtering on Si(111) substrates, 252 Cu by reactive magnetron sputter deposition, 87 Steel fabrication and characterization of MOS devices on 3C-SiC films mechanical characteristics of colored film on stainless steel by the grown by reactive magnetron sputtering on Si(111) substrates, 252 current pulse method, 80 Transmission electron microscopy (TEM) Stress microstructure of BN:C films deposited on Si substrates by reactive micromachined silicon cantilever beams for thin-film stress sputtering from a B,C target, 193 measurement, 214 Tribology Structural properties arc evaporated Ti-N films with reduced macroparticle contamination, composition and structure of reactively sputter-deposited molybdenum— 202 carbon films., 25 Tungsten oxide characterization of Pb,Mn, _ ,S thin films prepared by flash evaporation microstructural effect on NO, sensitivity of WO, thin film gas sensors technique, 110 Part 1. Thin film devices, sensors and actuators, 258 structure—fluorescence properties of some naphthoylene-benzimidazole- based Langmuir—Blodgett films, 232 Vanadium oxide structural study of Langmuir—Blodgett films built from Langmuir thermochromic VO, thin films studied by photoelectron spectroscopy, mono- and bilayers of a copper phthalocyanine derivative, 237 134 electromagnetic field resonance in thin amorphous films: a tool for non- destructive localization of thin marker layers by use of a standard Wear X-ray tube, 288 the tribological characteristics of titanium carbonitride coatings Superconductivity prepared by cathodic-arc ion plating technique, 16 preparation of YBa,Cu,O, superconducting thin films via combustion chemical vapor deposition, 32 X-ray diffraction Surface composition microstructure and physical properties of iron carbide films formed by properties of molecular organo-silicate composites submitted to ion plasma enhanced chemical vapor deposition, 8 irradiations, 65 effect of oxygen pressure on the orientation, lattice parameters, and XPS study of NbN and (NbTi)N superconducting coatings, 146 surface morphology of laser ablated BaTiO, thin films, 101 electrolytic oxygen evolution on Ni-P—Sc,O, composite layers, 164 yttria-stabilized zirconia thin films grown by reactive r.f. magnetron changes in surface composition of GaN by impurity doping, 184 sputtering, 104 Surface diffusion characterization of TiN films prepared by a conventional magnetron surface diffusion of Fe and island growth of FeSi, on Si(111) sputtering system: influence of nitrogen flow percentage and surfaces, 93 electrical properties, 115 Surface morphology photosensitive ZnCdS nanoparticles in a CdS matrix formed by high effect of oxygen pressure on the orientation, lattice parameters, and temperature sintering of ZnS and CdCl, in argon, 130 surface morphology of laser ablated BaTiO, thin films, 101 investigation of ultra thin Ca/Cd—arachidate films by Grazing characterizations of titanium oxide films prepared by radio frequency Incidence Diffraction (GID) with a conventional X-ray tube and a magnetron sputtering, 154 synchrotron radiation source, 225 Subject Index of Volume 287 / Thin Solid Films 287 (1996) 299-303 electrical conductivity of in situ ‘“hydrogen-reduced”’ and structural Yttrium properties of zinc oxide thin films deposited in different ambients preparation of YBa,Cu,O, superconducting thin films via combustion by pulsed excimer laser ablation, 280 chemical vapor deposition, 32 interdiffusion in compositionally modulated amorphous Nb/ Si multilayers, 293 Zinc oxide X-ray photoelectron spectroscopy electrical conductivity of in situ “‘hydrogen-reduced’’ and structural XPS study of NbN and (NbTi)N superconducting coatings, 146 properties of zinc oxide thin films deposited in different ambients changes in surface composition of GaN by impurity doping, 184 by pulsed excimer laser ablation, 280