ELSEVIER Thin Solid Films 253 (1994) 535-536 Author Index of Volume 253 Abelés, F., 257 Clift, W. M., 130 Hofmann, S., 293 Agrait, N., 199 Colliex, C., 299 Holloway, P. H., 490 Allen, L. H., 451, 456 Comfort, J. C., 262 Holmberg, K., 173 Allman, D. D. J., 451 Cottle, J. G., 513 Hong, Q. Z., 479 Amaratunga, G. A. J., 20, 146 Hong, S. Q., 479 Anast, M., 303 Daly, C., 190 Hong, T.-M., 162 Andre, B., 85 Daniels, B. J., 218 Howitt, D. G., 130 Anger, E., 85 Das, S. R., 467 Hsia, S. L., 462 Aparna, Y., 67 Dayalan, E., 53 Hussain, O. Md., 339 Arbilly, D., 62 Dayton, Jr., J. A., 151 Hwang, C. T., 119 Auciello, O. H., 247 Delplancke, M. P., 85 Auner, G. W., 223 Dennis, T., 41 Inoue, N., 518 Dew, S. K., 373, 3 Islam, Md. S., 318, 326 Baca, A. G., 496 Dietler, G., 308 Iwamoto, K., 518 Bammi, R., 501 Doerr, H. J., 95, Barr, T. L., 277 Dolle, M., 485 Jamting, A., 303 Bashyam, R., 141 Dunlop, H., 85 Janacek, T., 372 Bay, H. L., 485 Durand, R., 194 Jaworske, D. A., 233 Beck, U., 33 D’Heurle, F. M., Jayne, D. T., 285 Belin, M., 194 Jehn, H. A., 33 Bell, J. M., 303 Elena, M., 78 Johansen, H., 28 Ben-Nissan, B., 303 Erck, R. A., 362 Johs, B. D., 25 Ben-Shalom, A., | Esteve, J., 136 Jou, J. H., 119 Bergstrom, D. B., 445 Exarhos, G. J., 41 Jou, S., 95 Berry, L. A., 382 Bhansali, S., 391 Feng, S. W., 402 Kang, S. B., 413 Binggeli, M., 308 Ferrari, S., 349 Kao, C. C., 277 Boisjolly, G., 299 Fisson, S., 257 Kaplan, L., 1, 62 Bonelli, M., 78 Frigerio, J. M., 257 Kataoka, M., 9 Boxman, R. L., 1, 62 Fukuda, |. 14 Kawasaki, H., 508 Braube, H., 28 Keeble, D. J., 141 Brener, R., 90 Garcia, R., 254 Kieu, H., 367 Brenner, D. W., 185 Gassig, U., 485 Killian, L., 299 Brett, M. J., 372, 386 Gleason, K. K., 157 Kim, G., 212 Brown, W. D., 407 Goldsmith, S.. 1, 62 Kim, H. J., 377, 413, 435 Bunshah, R. F., 95, 212 Gorbatktin, S. M., 382 Kim, H. S., 377, 413 Burger, J., 308 Gould, R. D., 529 Kim, 1.-H., 47 Burhanuddin, Z. A., 53 Gouzman, L., 90 Kim, K.-J., 377, 413 Byun, J. S., 413 Grandremy, G., 125 Kim, S.-H., 47 Greene, J. E., 445 Kim, S.-O., 377, 413, 435 Cale, T. S., 419, 501, 522 Grivna, G., 501! Kim, S. H., 109 Calliari, L., 78 Gruen, D. M., 247 Klaus, E. J.. 130 Capelletti, R., 78 Guzman, L., 78 Klem, J. F., 469 Cardinale, G. F., 130 Klonaris, N., 513 Cha, Y. C., 212 Haas, T. W., 490 Kodama, N., 395 Chang, L.-H., 430 Hacker, E., 333 Krainsky, I. L.. 151 Chang, R. P. H., 247 Hale, J., 57 Krauss, A. R., 247 Chen, C.-F., 162, 168 Haller, O., 445 Krim, J., 190 Chen, L. M., 277 Halvarsson, M., 311 Kubota, Y., 518 Chen, S.-H., 162, 168 Han, M. Y., 119 Kulkarni, A. K., 141 Cheng, P.. 141 Hag, S., 20 Kuo, P. K., 223 Chiou, Y. H., 119 Harper, J. M. E., 479 Kuroda, K., 72, 518 Chong, M., 9 Hino, T., 425, 518 Christoph, R.. 308 Hirohata, Y., 425, 518 Labohm, F., 85 Cifre, J., 136 Hirose, Y., 356 Lampert, W. V., 490 Clemens, B. M., 218 Hoffman, A., 90 Lauth, H., 333 Elsevier Science S.A. 536 Lee, J.-W., 109 Pascal, H., 194 Smy, T. J., 372 Lessard, R. A., 228 Patscheider, J., 114 Sogabe, T., 518 Leu, J.-S., 162 Patterson, J. K., 456 Sone, J. H., 377, 413 Liao, H., 419 Peters, M. W., 522 Sonohara, H., 14 Liliental-Weber, Z., 490 Petrov, 1., 445 Sood, D. K., 391 Lin, X. W., 490 Pimentel, F., 293 Southwell, R. P., 473 Polo, M. C., 136 Sravani, C., 339 Lindulf, N., 311 Polonioli, P., 349 Srinivasulu Naidu, B., 67 Liu, D., 372, 386 Pryor, R. W., 243 Steffen, H. J., 269 Loubet, J. L., 194 Puigdollers, J., 136 Steiger, B., 28 Lovejoy, M. L., 496 Steiner, A., 78 Lynch, W. T., 462 Raaijmakers, I. J., 367 Streitz, F. H., 179 Ramaswami, M., 522 Sun, S. C., 440 Ramesham, R., 151 Swain, M., 344 Reddy, K. T. R., 238, 339 Swain, M. V., 204 Reddy, J. P., 67, 238, 339 Swider, W., 490 Makovicka, T., 57 Reeve, S. W., 103 Malshe, A. P., 407 Reichling, M., 333 Tabet, M. F., 402 Manivannan, G., 228 Reiners, G., 33 Tait, R. N., 386 Mant, S., 485 Reyes-Gasga, J., 254 Takata, S., 14 Marti, O., 308 Rhoades, R. L., 382 Tan, T. Y., 462 Martini, T., 28 Rieger, D. J., 496 Tepman, A., 367 Matsubara, Y., 395 Ritley, K., 456 Thomas, R. L., 243 Matsuda, T., 518 Rivory, J., 257, 299 Thomsen-Schmidt, P., 28 Matthews, A., 173 Rockett, A., 456 Tian, F., 445 Matthias, E., 333 Rodrigo, H., 141 Tokura, H., 344 McCarty, K. F., 130 Rodrigo, J. G., 199 Tomar, M. S., 53 McGahan, W. A., 25, 57 Romine, P., 318 Tominaga, K., 9 McGuire, G. E., 462 Rose, M. F., 151 Tsai, M. H., 440 McNamara, K. M., 157 Rosenberg, U., | Tsai, W., 386 Mearini, G. T., 151 Rossi, F., 85 Tupper, K. J., 185 Medlin, D. L., 130 Rothwarf, A., 62 Mentik, J., 204 Rubio, G., 199 Ueda, T., 9 Mendicino, M. A., 473 Rusli, 20 Urban III, F. K., 262, 318, 326, 402 Meyyappan, I., 407 Ruzakowski Athey, P., 326 Mijnarends, P. E., 85 Vieira, S., 199 Minami, T., 14 Sagara, A., 518 Villanueva, S., 243 Mintmire, J. W., 179 Saha, N. C., 430 Vuorinen, S., 311 Miotello, A., 78 Saka, H., 72 Vuye, G., 257 Mirkarimi, P. B., 130 Salke, E., 20 van Veen, A., 85 Sasaki, T., 356 Miyata, T., 14 Mori, I., 9 Sato, H., 14 Wada, T., 72 Moro, L., 78 Scardi, P., 349 Wang, L. Q., 41 Moser, J. H., 445 Schaeffer, J. C., 285 Wang, Y., 257 Motojima, O., 518 Schafer, D., 28 Wang, Y. X., 151 Murphy, W. H., 285 Scheibe, H.-J., 125 Washburn, J., 490 Myers, F. R., 522 Schneider, D., 125 Watanabe, T., 72 Schultrich, B., 125 Weimer, W. A., 103 Schultz, J. A., 247 Wiemer, C., 445 Naem, A., 467 Schiippen, A., 485 Window, B., 344 Nainaparampil, J. J., 402 Schut, H., 85 Woollam, J. A., 25, 57 Naseem, H. A., 407 Scruggs, B. E., 157 Wu, Z. L., 223, 243 Nathan, M., | Seal, S., 277 Natsir, N., 518 Seebauer, E. G., 473 Xiao, H. Z., 456 Neely, D., 344 Sekine, M., 395 Xu, D.-X., 467 Nguyen Van, V., 257 Nix, W. D., 218 Sheergar, K., 467 Xu, Z., 367 Noda, N., 518 Sherwin, M. E., 496 Xue, S. S., 228 Shih, H. C., 119 Noguchi, K., 395 Shimamoto, N., 425 Yabe, K., 425 Nordén, H., 311 Shintani, Y., 9 Yabe, M., 518 Shrotriya, A., 141 Yamashima, T., 425, 518 Okumura, K., 395 Shul, R. J., 496 Yamashita, H., 72 Oral, B., 114 Siegel, J., 333 Yamashita, N., 72 Ossi, P. M., 78 Siemroth, P., 125 Yu, T.-K., 508 Silva, S. R. P., 20, 146 Yu-Zhang, K., 299 Padmanabhan, K. R., 243 Sirvent, C., 199 Panjan, P., 293 Smialek, J. L., 285 Zalar, A., 293 Park, B. J., 456 Smith, P. L., 462 Zmood, R. B., 391 Park, Y. S., 109 Smy, T., 386 Zolper, J. C., 496 ELSEVIER Thin Solid Films 253 (1994) 537-543 Subject Index of Volume 253 Adhesion modelling of surface roughness in variable-angle spectroscopic effects of hydrogen annealing, sulfur segregation and diffusion ellipsometry, using numerical processing of atomic force on the cyclic oxidation resistance of superalloys: a review, microscopy images, 326 285 plastic deformation in atomic size contacts, 199 mechanical property characterization of thin films using triboscopic description of local wear phenomena under an spherical tipped indenters, 204 AFM tip, 194 pin-pull adhesion measurements of copper films on Auger electron spectroscopy ion-bombarded alumina, 362 carbon nitride formation by low-energy nitrogen implantation Adsorption into graphite, 90 atomic-scale friction measurements of silver and chemisorbed interfacial reactions in dynamically heated Si/Me/Si sandwich oxygen surfaces, 190 layers, 293 Alloys use of valence band Auger electron spectroscopy to study thin kinetics of Ni/a-Ge bilayer reactions, 456 film growth: oxide and diamond-like carbon films, 269 Aluminium Al planarization processes for multilayer metallization of Band structure quarter micrometer devices, 367 photoacoustic studies of laser damage in oxide thin films, 333 Aluminium nitride Binding energy effects of ion beam irradiation on the properties and epitaxial new interpretation of the binding energies in X-ray growth of aluminium nitride film by the ion beam assisted photoelectron studies of oxides, 277 deposition process, 47 Boron microstructure and thermal conductivity of epitaxial AIN thin comparative study of trimethylboron doping of hot filament films, 223 chemically vapour deposited and microwave plasma Aluminium oxide chemically vapour deposited diamond films, 136 electrostatic-based model for alumina surfaces, 179 properties of boron coatings used as plasma facing material of microstructural investigation of the x-Al,O, — «-Al,O, fusion device, 518 transformation in multilayer coatings of chemically vapour Boron nitride deposited x-Al,O,, 311 characterization of laser-ablated boron nitride thin films on new interpretation of the binding energies in X-ray silicon, 243 photoelectron studies of oxides, 277 cross-section transmission electron microscopy observations of pin-pull adhesion measurements of copper films on c-BN films deposited on Si by ion-beam-assisted ion-bombarded alumina, 362 deposition, 72 Amorphous materials effects of ambient conditions on the adhesion of cubic boron amorphous Si thin films prepared by vacuum arc deposition, nitride films on silicon substrates, 130 62 synthesis and structural characterization of boron nitride thin elastic modulus of diamond-like carbon films prepared by films, 78 pulsed vacuum arc, 125 optical quantum size effects in diamond-like carbon Cadmium telluride superlattice structures, 20 investigations on n-CdO/p-CdTe thin film heterojunctions, 339 use of space-charge-limited current to evaluate the electronic Capacitors density of states in diamond-like carbon thin films, 146 effects of substrate and annealing ambient on the electrical Annealing properties of Ta,O, thin films prepared by plasma annealing and Sb-doping of Sn—O films produced by filtered enhanced chemical vapor deposition, 435 vacuum arc deposition: structure and electro-optical Carbon properties, | carbon nitride formation by low-energy nitrogen implantation opening and closing of channels during phase transitions in into graphite, 90 Al-Mn thin films, 254 diamond coatings from a solid carbon source, 95 Atomic force microscopy elastic modulus of diamond-like carbon films prepared by advanced image processing in scanning probe microscopy, 318 pulsed vacuum arc, 125 aspects of the surface roughness of ceramic bonding tools on a modified Forouhi and Bloomer dispersion model for the nanometer scale investigated with atomic force optical constants of amorphous hydrogenated carbon thin microscopy, 308 films, 57 microstructure and thermal conductivity of epitaxial AIN thin optical quantum size effects in diamond-like carbon films, 223 superlattice structures, 20 Elsevier Science S.A. physical properties of nitrogenated amorphous carbon films electrostatic-based model for alumina surfaces, 179 produced by ion-beam-assisted deposition, 85 molecular dynamics simulations of friction in self-assembled use of space-charge-limited current to evaluate the electronic monolayers, 185 density of states in diamond-like carbon thin films, 146 transport through multicomponent dual frequency plasma Carbon dioxide sheaths, 522 study of the loss of pattern definition in diamond growth, 168 Conductivity Ceramics a.c. properties of ZnO thin films prepared by r.f. magnetron Ba, Sr, _ , TiO, thin films by a chemical process, 53 sputtering, 529 Charging Contacts new interpretation of the binding energies in X-ray high resistivity Co and Ti silicide formation on photoelectron studies of oxides, 277 silicon-on-insulator substrates, 462 Chemical vapour deposition morphology of Al- Ni-Ge ohmic contacts to n-GaAs as a Au/(Ti—W) and Au/Cr metallization of chemically function of contact composition, 490 vapor-deposited diamond substrates for multichip module non-alloyed, refractory metal contact optimization with applications, 407 shallow implantations of Zn and Mg, 496 chemical vapor deposition of TiSi, using SiH, and TiCl,, 473 Copper deposition of white diamond thin films by increasing the total Cu deposition using a permanent magnet electron cyclotron pressure in a microwave-pl hanced chemical vapour resonance microwave plasma source, 382 deposition system, 109 pin-pull adhesion measurements of copper films on effect of impurities on the IR absorption of chemically vapour ion-bombarded alumina, 362 deposited diamond, 157 selective electroless copper plating on silicon seeded by copper electrical properties of diamond thin films grown by chemical ion implantation, 391 vapor deposition technique, 141 fabrication of an electron multiplier utilizing diamond films, 151 Deposition process internal stress of chemical vapour deposition diamond film on amorphous Si thin films prepared by vacuum arc deposition, silicon, 119 62 optical characterization of diamond synthesized using annealing and Sb-doping of Sn—O films produced by filtered CH,-—CO, gas mixtures without supplying hydrogen gas, vacuum arc deposition: structure and electro-optical 162 properties, | optimizing the gas phase chemistry in a d.c. arcjet diamond Ba, Sr, _ , TiO, thin films by a chemical process, 53 chemical vapor deposition reactor, 103 Cu deposition using a permanent magnet electron cyclotron preparation of milky transparent conducting ZnO films with resonance microwave plasma source, 382 textured surface by atmospheric chemical vapour effects of ion beam irradiation on the properties and epitaxial desposition using Zn(C,;H,O,),, 14 growth of aluminium nitride film by the ion beam assisted study of the loss of pattern definition in diamond growth, 168 deposition process, 47 use of space-charge-limited current to evaluate the electronic laser-assisted deposition of optical coatings, 28 density of states in diamond-like carbon thin films, 146 physical properties of nitrogenated amorphous carbon films Clusters produced by ion-beam-assisted deposition, 85 gold and zinc thin films deposited by the ionized cluster beam preparation of conductive ZnO:Al films by a facing target technique, 402 system with a strong magnetic field, 9 Coatings spatially resolved densification of solution deposited zirconium advanced image processing in scanning probe microscopy, 318 dioxide films by laser irradiation, 41 Ba, Sr, _, TiO, thin films by a chemical process, 53 surface morphology examination of sol-gel deposited TiO, coatings tribology: a concept, critical aspects and future films, 303 directions, 173 TiN-capped TiSi, formation in W/TiSi, process for a effects of activated reactive evaporation process parameters on quarter-micron complementary metal-— oxide the microhardness of polycrystalline silicon carbide thin semiconductor, 395 films, 212 Depth profiling effects of ambient conditions on the adhesion of cubic boron interfacial reactions in dynamically heated Si/Me/Si sandwich nitride films on silicon substrates, 130 layers, 293 mechanical property characterization of thin films using residual stress distribution in electroplated Zn~-Ni alloy layer spherical tipped indenters, 204 determined by X-ray diffraction, 356 modelling of surface roughness in variable-angle spectroscopic Diamond ellipsometry, using numerical processing of atomic force Au/(Ti-W) and Au/Cr metallization of chemically microscopy images, 326 vapor-deposited diamond substrates for multichip module numerical ellipsometry: enhancement of new algorithms for applications, 407 real-time, in situ film growth monitoring, 262 comparative study of trimethylboron doping of hot filament Cobalt chemically vapour deposited and microwave plasma high resistivity Co and Ti silicide formation on chemically vapour deposited diamond films, 136 silicon-on-insulator substrates, 462 deposition of white diamond thin films by increasing the total triboscopic description of local wear phenomena under an pressure in a microwave-pl hanced chemical vapour AFM tip, 194 deposition system, 109 Computer simulation diamond coatings from a solid carbon source, 95 effects of collimation on intrinsic stress in sputter-deposited effect of impurities on the IR absorption of chemically vapour metallic thin films, 372 deposited diamond, 157 electrical properties of diamond thin films grown by chemical Electron microscopy vapor deposition technique, 141 characterization of TiO,/SiO, multilayers by high resolution fabrication of an electron multiplier utilizing diamond films, transmission electron microscopy and electron energy loss 151 spectroscopy, 299 internal stress of chemical vapour deposition diamond film on microstructural investigation of the x-Al,O, — z-Al,O, silicon, 119 transformation in multilayer coatings of chemically vapour nucleation studies of thin diamond films on model substrates, deposited x-Al,O,, 311 114 opening and closing of channels during phase transitions in optical characterization of diamond synthesized using Al—Mn thin films, 254 CH,-—CO, gas mixtures without supplying hydrogen gas, thickness dependence of the properties and thermal stability of 162 PtSi films, 467 optimizing the gas phase chemistry in a d.c. arcjet diamond Electronic devices chemical vapor deposition reactor, 103 electrical and structural properties of buried CoSi, layers in study of the loss of pattern definition in diamond growth, 168 Si( 100) grown by molecular beam allotaxy, 485 use of valence band Auger electron spectroscopy to study thin fabrication of an electron multiplier utilizing diamond films, film growth: oxide and diamond-like carbon films, 269 151 Dielectric properties Ellipsometry a.c. properties of ZnO thin films prepared by r.f. magnetron growth of low and high refractive index dielectric layers as sputtering, 529 studied by in situ ellipsometry, 257 Dielectrics modelling of surface roughness in variable-angle spectroscopic numerical simulations of thin film thermal flow, 419 ellipsometry, using numerical processing of atomic force Diffusion microscopy images, 326 interfacial reactions in dynamically heated Si/Me/Si sandwich modified Forouhi and Bloomer dispersion model for the optical constants of amorphous hydrogenated carbon thin layers, 293 films, 57 numerical ellipsometry: enhancement of new algorithms for real-time, in situ film growth monitoring, 262 Elastic properties elastic modulus of diamond-like carbon films prepared by optical analysis of complex multilayer structures using multiple pulsed vacuum arc, 125 data types, 25 mechanical property characterization of thin films using Epitaxy electrical and structural properties of buried CoSi, layers in spherical tipped indenters, 204 Si( 100) grown by molecular beam allotaxy, 485 plastic deformation in atomic size contacts, 199 enhanced mechanical hardness in compositionally modulated Electrical properties and measurements Fe(001)/Pt(001) and Fe(001)/Cr(001) epitaxial thin films, a.c. properties of ZnO thin films prepared by r.f. magnetron 218 sputtering, 529 microstructure and thermal conductivity of epitaxial AIN thin characterization of p-CuGay 5<Ing >;Se,/n-Zng ,s<Cdy 6<S polycrystalline thin film heterojunctions, 67 films, 223 Etching characterization of thin film ZnO/ZnCdS/CuGaAse, development of a gate metal etch process for gallium arsenide heterojunctions, 238 wafers, 501 effects of electro- and stress migration forces on the 1/fx noise Ethylene of patterned thin metal films, 513 atomic-scale friction measurements of silver and chemisorbed effects of substrate and annealing ambient on the electrical oxygen surfaces, 190 properties of Ta,O, thin films prepared by plasma Evaporation enhanced chemical vapor deposition, 435 effects of activated reactive evaporation process parameters on electrical properties of diamond thin films grown by chemical the microhardness of polycrystalline silicon carbide thin vapor deposition technique, 141 films, 212 electrical properties of the p*-gate electrode of an a-Si/poly-Si double layer, 413 formation of low pressure chemically vapour deposited W thin Factor analysis film on silicon dioxide for gate electrode application, 377 use of valence band Auger electron spectroscopy to study thin investigations on n-CdO/p-CdTe thin film heterojunctions, 339 film growth: oxide and diamond-like carbon films, 269 use of space-charge-limited current to evaluate the electronic Fluorescence density of states in diamond-like carbon thin films, 146 spatially resolved densification of solution deposited zirconium Electromigration dioxide films by laser irradiation, 41 Fluorine effects of electro- and stress migration forces on the |/fa noise of patterned thin metal films, 513 growth of low and high refractive index dielectric layers as realistic electromigration lifetime projection of VLSI studied by in situ ellipsometry, 257 interconnects, 508 Fourier transform infrared spectroscopy Electron diffraction optical characterization of diamond synthesized using CH,—CO, gas mixtures without supplying hydrogen gas, high resistivity Co and Ti silicide formation on 162 silicon-on-insulator substrates, 462 Electron energy loss spectroscopy characterization of TiO,/SiO, multilayers by high resolution Gallium arsenide transmission electron microscopy and electron energy loss development of a gate metal etch process for gallium arsenide spectroscopy, 299 wafers, 501 morphology of Al-Ni-—Ge ohmic contacts to n-GaAs as a synthesis and structural characterization of boron nitride thin function of contact composition, 490 films, 78 non-alloyed, refractory metal contact optimization with Interfaces shallow implantations of Zn and Mg, 496 cross-section transmission electron microscopy observations of Germanium c-BN films deposited on Si by ion-beam-assisted kinetics of Ni/a-Ge bilayer reactions, 456 deposition, 72 Glass interfacial reactions in dynamically heated Si/Me/Si sandwich modelling of surface roughness in variable-angle spectroscopic layers, 293 ellipsometry, using numerical processing of atomic force lon bombardment microscopy images, 326 bombardment and gas rarefaction effects on the properties of numerical simulations of thin film thermal flow, 419 sputtered Ti thin films, 386 Glow discharge carbon nitride formation by low-energy nitrogen implantation properties of boron coatings used as plasma facing material of into graphite, 90 fusion device, 518 cross-section transmission electron microscopy observations of Gold c-BN films deposited on Si by ion-beam-assisted Au/(Ti-W) and Au/Cr metallization of chemically deposition, 72 vapor-deposited diamond substrates for multichip module effects of ion beam irradiation on the properties and epitaxial applications, 407 growth of aluminium nitride film by the ion beam assisted gold and zinc thin films deposited by the ionized cluster beam deposition process, 47 technique, 402 physical properties of nitrogenated amorphous carbon films Graphite produced by ion-beam-assisted deposition, 85 carbon nitride formation by low-energy nitrogen implantation pin-pull adhesion measurements of copper films on into graphite, 90 ion-bombarded alumina, 362 nucleation studies of thin diamond films on model substrates, single-phase polycrystalline Ti, .W.N alloys (0<.x <0.7) 114 grown by UHV reactive magnetron sputtering: Growth mechanism microstructure and physical properties, 445 aspects of the surface roughness of ceramic bonding tools on a lon implantation nanometer scale investigated with atomic force electrical properties of the p*-gate electrode of an a-Si/poly-Si microscopy, 308 double layer, 413 chemical vapor deposition of TiSi, using SiH, and TiCl,, 473 non-alloyed, refractory metal contact optimization with opening and closing of channels during phase transitions in shallow implantations of Zn and Mg, 496 Al-Mn thin films, 254 selective electroless copper plating on silicon seeded by copper optimizing the gas phase chemistry in a d.c. arcjet diamond ion implantation, 391 chemical vapor deposition reactor, 103 lon scattering atmosphere influence on in-situ ion beam analysis of thin film growth, 247 Hardness transport through multicomponent dual frequency plasma coatings tribology: a concept, critical aspects and future sheaths, 522 directions, 173 effects of activated reactive evaporation process parameters on the microhardness of polycrystalline silicon carbide thin Laser ablation films, 212 characterization of laser-ablated boron nitride thin films on enhanced mechanical hardness in compositionally modulated silicon, 243 Fe(001)/Pt(001) and Fe(001)/Cr(001) epitaxial thin films, photoacoustic studies of laser damage in oxide thin films, 333 218 Laser irradiation mechanical property characterization of thin films using laser-assisted deposition of optical coatings, 28 spherical tipped indenters, 204 spatially resolved densification of solution deposited zirconium microstructure and mechanical properties of sputtered platinum dioxide films by laser irradiation, 41 films, 344 Heat treatment opening and closing of channels during phase transitions in Metallization Al-Mn thin films, 254 Al planarization processes for multilayer metallization of Heterostructures quarter micrometer devices, 367 investigations on n-CdO/p-CdTe thin film heterojunctions, 339 Au/(Ti—W) and Au/Cr metallization of chemically Hydrocarbons vapor-deposited diamond substrates for multichip module modified Forouhi and Bloomer dispersion model for the applications, 407 optical constants of amorphous hydrogenated carbon thin comparison of chemical vapor deposition of TiN using films, 57 tetrakis-diethylamino-titanium and tetrakis-dimethylamino-titanium, 440 Cu deposition using a permanent magnet electron cyclotron Impurities resonance microwave plasma source, 382 effect of impurities on the IR absorption of chemically vapour effect of dimension sealing on the nucleation of C54 TiSi,, 451 deposited diamond, 157 effects of electro- and stress migration forces on the |/fa noise Infrared spectroscopy of patterned thin metal films, 513 effect of impurities on the IR absorption of chemically vapour morphology of Al-Ni-Ge ohmic contacts to n-GaAs as a deposited diamond, 157 function of contact composition, 490 realistic electromigration lifetime projection of VLSI Organometallic vapour deposition interconnects, 508 comparison of chemical vapor deposition of TiN using Metals tetrakis-diethylamino-titanium and enhanced mechanical hardness in compositionally modulated tetrakis-dimethylamino-titanium, 440 Fe(001)/Pt(001) and Fe(001)/Cr(001) epitaxial thin films, Oxidation 218 effects of hydrogen annealing, sulfur segregation and diffusion plastic deformation in atomic size contacts, 199 on the cyclic oxidation resistance of superalloys: a review, Methane 285 internal stress of chemical vapour deposition diamond film on new interpretation of the binding energies in X-ray silicon, 119 photoelectron studies of oxides, 277 study of the loss of pattern definition in diamond growth, 168 properties of boron coatings used as plasma facing material of Monolayers fusion device, 518 molecular dynamics simulations of friction in self-assembled use of valence band Auger electron spectroscopy to study thin monolayers, 185 film growth: oxide and diamond-like carbon films, 269 Multilayers Oxides enhanced mechanical hardness in compositionally modulated Ba, Sr, _, TiO, thin films by a chemical process, 53 Fe(001)/Pt(001) and Fe(001)/Cr(001) epitaxial thin films, laser-assisted deposition of optical coatings, 28 218 Phase transitions Nanostructures effect of dimension sealing on the nucleation of C54 TiSi,, 451 aspects of the surface roughness of ceramic bonding tools on a microstructural investigation of the x-Al,O, + «-Al,O, nanometer scale investigated with atomic force transformation in multilayer coatings of chemically vapour microscopy, 308 deposited x-Al,O,, 311 plastic deformation in atomic size contacts, 199 spatially resolved densification of solution deposited zirconium Nickel dioxide films by laser irradiation, 41 kinetics of Ni/a-Ge bilayer reactions, 456 TiN-capped TiSi, formation in W/TiSi, process for a numerical ellipsometry: enhancement of new algorithms for quarter-micron coplementary metal-oxide-semiconductor, real-time, in situ film growth monitoring, 262 395 Nitrides Physical vapour deposition decorative optical coatings, 33 decorative optical coatings, 33 Nucleation effects of collimation on intrinsic stress in sputter-deposited effect of dimension sealing on the nucleation of C54 TiSi,, 451 metallic thin films, 372 formation of low pressure chemically vapour deposited W thin gold and zinc thin films deposited by the ionized cluster beam film on silicon dioxide for gate electrode application, 377 technique, 402 nucleation studies of thin diamond films on model substrates, physical properties of nitrogenated amorphous carbon films 114 produced by ion-beam-assisted deposition, 85 synthesis and structural characterization of boron nitride thin Optical coatings films, 78 growth of low and high refractive index dielectric layers as Planarization studied by in situ ellipsometry, 257 Al planarization processes for multilayer metallization of laser-assisted deposition of optical coatings, 28 quarter micrometer devices, 367 optical characterization of diamond synthesized using numerical simulations of thin film thermal flow, 419 CH,-—CO, gas mixtures without supplying hydrogen gas, Plasma processing and deposition 162 Al planarization processes for multilayer metallization of photoacoustic studies of laser damage in oxide thin films, 333 quarter micrometer devices, 367 preparation of conductive ZnO:Al films by a facing target bombardment and gas rarefaction effects on the properties of system with a strong magnetic field, 9 sputtered Ti thin films, 386 Optical properties Cu deposition using a permanent magnet electron cyclotron characterization of p-CuGay »<Iny >,Se,/n-Zng y<Cdo 65S resonance microwave plasma source, 382 polycrystalline thin film heterojunctions, 67 deposition of white diamond thin films by increasing the total characterization of thin film ZnO/ZnCdS/CuGaSe, pressure in a microwave-pl hanced chemical vapour heterojunctions, 238 deposition system, 109 decorative optical coatings, 33 diamond coatings from a solid carbon source, 95 emittance characterization of thermal control paints, coatings effects of substrate and annealing ambient on the electrical and surfaces using a calorimetric technique, 233 properties of Ta,O, thin films prepared by plasma modified Forouhi and Bloomer dispersion model for the enhanced chemical vapor deposition, 435 optical constants of amorphous hydrogenated carbon thin elastic modulus of diamond-like carbon films prepared by films, 57 pulsed vacuum arc, 125 numerical ellipsometry: enhancement of new algorithms for properties of boron coatings used as plasma facing material of real-time, in situ film growth monitoring, 262 fusion device, 518 optical quantum size effects in diamond-like carbon transport through multicomponent dual frequency plasma superlattice structures, 20 sheaths, 522 Optical spectroscopy Platinum holographic and spectroscopic characterization of spiropyran microstructure and mechanical properties of sputtered platinum doped poly(methyl methacrylate) films, 228 films, 344 542 Polymers Silicon nitride holographic and spectroscopic characterization of spiropyran properties of silicon nitride films prepared by magnetron doped poly( methyl methacrylate) films, 228 sputtering, 425 UV-radiation-induced degradation of fluorinated polyimide Silicon oxide films, 430 advanced image processing in scanning probe microscopy, 318 characterization of TiO,/SiO, multilayers by high resolution Quantum effects transmission electron microscopy and electron energy loss optical quantum size effects in diamond-like carbon superlattice spectroscopy, 299 structures, 20 electrical properties of the p’ -gate electrode of an a-Si/poly-Si double layer, 413 Radiation damage numerical simulations oft hin film thermal flow, 419 UV-radiation-induced degradation of fluorinated polyimide transport through multicomponent dual frequency plasma films, 430 sheaths, 522 Raman scattering Silver comparative study of trimethylboron doping of hot filament atomic-scale friction measurements of silver and chemisorbed chemically vapour deposited and microwave plasma oxygen surfaces, 190 chemically vapour deposited diamond films, 136 Solar cells electrical properties of diamond thin films grown by chemical characterization of p-CuGay 5<Ing 7,Se,/n-Zny 4<Cdy «<8 vapor deposition technique, 141 polycrystalline thin film heterojunctions, 67 optimizing the gas phase chemistry in a d.c. arcjet diamond characterization of thin film ZnO/ZnCdS/CuGaSe, chemical vapor deposition reactor, 103 heterojunctions, 238 Reaction kinetics investigations on n-CdO/p-CdTe thin film heterojunctions, 339 kinetics of Ni/a-Ge bilayer reactions, 456 preparation of milky transparent conducting ZnO films with thermal stability of silicide on polycrystalline Si, 479 textured surface by atmospheric chemical vapour deposition Reflection spectroscopy thickness dependence of the properties and thermal stability of using Zn(C.H,O,),, 14 PtSi films, 467 Sputtering atmosphere influence on in-situ ion beam analysis of thin film Rutherford backscattering spectroscopy growth, 247 properties of silicon nitride films prepared by magnetron bombardment and gas rarefaction effects on the properties of sputtering, 425 sputtered Ti thin films, 386 Schottky barrier diamond coatings from a solid carbon source, 95 electrical and structural properties of buried CoSi, layers in microstructure and mechanical properties of sputtered platinum Si( 100) grown by molecular beam allotaxy, 485 films, 344 Secondary electron emission preparation of conductive ZnO:Al films by a facing target system fabrication of an electron multiplier utilizing diamond films, 151 with a strong magnetic field, 9 Semiconductors properties of silicon nitride films prepared by magnetron characterization of p-CuGay 5<Ing >,Se,/n-Zny ,<Cdo 65S sputtering, 425 polycrystalline thin film heterojunctions, 67 residual stress in stabilized zirconia thin films prepared by rf. microstructure and thermal conductivity of epitaxial AIN thin magnetron sputtering, 349 films, 223 single-phase polycrystalline Ti, _,W,N alloys (0<x <0.7) thermal stability of silicide on polycrystalline Si, 479 grown by UHV reactive magnetron sputtering: Silicides microstructure and physical properties, 445 chemical vapor deposition of TiSi, using SiH, and TiCl,, 473 Stress effect of dimension sealing on the nucleation of C54 TiSi,, 451 effects of collimation on intrinsic stress in sputter-deposited electrical and structural properties of buried CoSi, layers in metallic thin films, 372 Si( 100) grown by molecular beam allotaxy, 485 effects of electro- and stress migration forces on the |//x noise of high resistivity Co and Ti silicide formation on patterned thin metal films, 513 silicon-on-insulator substrates, 462 internal stress of chemical vapour deposition diamond film on thermal stability of silicide on polycrystalline Si, 479 silicon, 119 thickness dependence of the properties and thermal stability of microstructure and mechanical properties of sputtered platinum PtSi films, 467 films, 344 TiN-capped TiSi, formation in W/TiSi, process for a realistic electromigration lifetime projection of VLSI quarter-micron complementary metal- oxide interconnects, 508 semiconductor, 395 residual stress distribution in electroplated Zn— Ni alloy layer Silicon determined by X-ray diffraction, 356 amorphous Si thin films prepared by vacuum arc deposition, 62 residual stress in stabilized zirconia thin films prepared by rf. characterization of laser-ablated boron nitride thin films on magnetron sputtering, 349 silicon, 243 Structural properties selective electroless copper plating on silicon seeded by copper annealing and Sb-doping of Sn-O films produced by filtered ion implantation, 391 vacuum arc deposition: structure and electro-optical thermal stability of silicide on polycrystalline Si, 479 properties, | Silicon carbide Ba, Sr, _ , TiO, thin films by a chemical process, 53 effects of activated reactive evaporation process parameters on decorative optical coatings, 33 the microhardness of polycrystalline silicon carbide thin electrical properties of the p‘ -gate electrode of an a-Si/poly-Si films, 212 double layer, 413 543 synthesis and structural characterization of boron nitride thin surface morphology examination of sol-gel deposited TiO, films, films, 78 303 Sulphur Transmission electron microscopy effects of hydrogen annealing, sulfur segregation and diffusion on cross-section transmission electron microscopy observations of the cyclic oxidation resistance of superalloys: a review, 285 c-BN films deposited on Si by ion-beam-assisted deposition, Surface composition 72 atmosphere influence on in-situ ion beam analysis of thin film effects of ion beam irradiation on the properties and epitaxial growth, 247 growth of aluminium nitride film by the ion beam assisted Surface energy deposition process, 47 electrostatic-based model for alumina surfaces, 179 formation of low pressure chemically vapour deposited W thin opening and closing of channels during phase transitions in film on silicon dioxide for gate electrode application, 377 Al- Mn thin films, 254 high resistivity Co and Ti silicide formation on Surface morphology silicon-on-insulator substrates, 462 advanced image processing in scanning probe microscopy, 318 Tribology deposition of white diamond thin films by increasing the total aspects oft he surface roughness of ceramic bonding tools on a pressure in a microwave-plasma-enhanced chemical vapour nanometer scale investigated with atomic force microscopy, deposition system, 109 308 morphology of Al- Ni-Ge ohmic contacts to n-GaAs as a atomic-scale friction measurements of silver and chemisorbed function of contact composition, 490 oxygen surfaces, 190 preparation of milky transparent conducting ZnO films with coatings tribology: a concept, critical aspects and future textured surface by atmospheric chemical vapour deposition directions, 173 using Zn(C.H,O,),, 14 triboscopic description of local wear phenomena under an AFM surface morphology examination of sol-gel deposited TiO, films, tip, 194 303 Tungsten Surface roughness formation of low pressure chemically vapour deposited W thin coatings tribology: a concept, critical aspects and future film on silicon dioxide for gate electrode application, 377 directions, 173 realistic electromigration lifetime projection of VLSI Surface segregation interconnects, 508 effects of hydrogen annealing, sulfur segregation and diffusion on single-phase polycrystalline Ti, _ WN alloys (0< x < 0.7) the cyclic oxidation resistance of superalloys: a review, 285 grown by UHV reactive magnetron sputtering: Surface stress microstructure and physical properties, 445 residual stress in stabilized zirconia thin films prepared by r-f. magnetron sputtering, 349 X-ray diffraction Surface structure comparative study of trimethylboron doping of hot filament atmosphere influence on in-situ ion beam analysis of thin film chemically vapour deposited and microwave plasma growth, 247 chemically vapour deposited diamond films, 136 electrostatic-based model for alumina surfaces, 179 microstructural investigation of the x-Al,O, — 2-Al,O, transformation in multilayer coatings of chemically vapour deposited «-Al,O,, 311 Tantalum residual stress distribution in electroplated Zn— Ni alloy layer effects of substrate and annealing ambient on the electrical determined by X-ray diffraction, 356 properties of Ta,O, thin films prepared by plasma enhanced residual stress in stabilized zirconia thin films prepared by r-f. chemical vapor deposition, 435 magnetron sputtering, 349 Thermal desorption thickness dependence of the properties and thermal stability of chemical vapor deposition of TiSi, using SiH, and TiCl,, 473 PtSi films, 467 Titanium X-ray photoelectron spectroscopy bombardment and gas rarefaction effects on the properties of nucleation studies of thin diamond films on model substrates, sputtered Ti thin films, 386 114 effects of collimation on intrinsic stress in sputter-deposited properties of silicon nitride films prepared by magnetron metallic thin films, 372 sputtering, 425 TiN-capped TiSi, formation in W/TiSi, process for a UV-radiation-induced degradation of fluorinated polyimide quarter-micron complementary metal -o xide films, 430 semiconductor, 395 Titanium nitride Zine comparison of chemical vapor deposition of TiN using gold and zinc thin films deposited by the ionized cluster beam tetrakis-diethylamino-titanium and technique, 402 tetrakis-dimethylamino-titanium, 440 non-alloyed, refractory metal contact optimization with shallow single-phase polycrystalline Ti, WN alloys (0< x < 0.7) implantations of Zn and Mg, 496 grown by UHV reactive magnetron sputtering: Zinc oxide microstructure and physical properties, 445 a.c. properties of ZnO thin films prepared by r.f. magnetron Titanium oxide sputtering, 529 characterization of TiO,/SiO, multilayers by high resolution preparation of conductive ZnO:Al films by a facing target system transmission electron microscopy and electron energy loss with a strong magnetic field, 9 spectroscopy, 299 preparation of milky transparent conducting ZnO films with growth of low and high refractive index dielectric layers as textured surface by atmospheric chemical vapour studied by in situ ellipsometry, 257 desposition using Zn(C,H,O,),, 14