Thin Solid Films, 212 (1992) 297 Author Index for Volume 212 Alam, M., 173 Guo, F. S., 133 Polyakov, V. I., 226 Amaratunga, G. A. J., 232 Guo, H., 173 Pool, F. S., 150 Anthony, T. R., 1 Guo, W.-T., 137 Prins, J. F., 11 Purdes, A. J., 140 Babu, S. V., 251 Hamill, G., 180 Pypkin, B. N., 274 Baglio, J. A., 180 Hankin, S., 180 Baik, Y.-J., 104, 156 Harris, S. J., 193, 201 Ramesham, R., 56, 96 Bakker, J., 282 Herchen, H., 206 Rau, B., 245 Banholzer, W. F., 1 Hirata, A., 43 Rich, D. H., 150 Belton, D. N., 68, 193 Hong, F. C.-N, 127 Richter, F., 245 Beulens, J. J., 282 Hsieh, J.-C., 127 Rodichev, D., 274 Bewilogua, K., 245 Hwang, J.-H., 127 Roppel, T., 56, 96 Borra, R. T., 274 Rother, B., 245 Bozhko, A., 274 Jander, D. R., 216 Buuron, A. J. M., 282 Johnson, N. M., 63 Sasaki, K., 164 Johnson, R. W., 96 Schmieg, S. J., 68 Cappelli, M. A., 206 Schram, D. C., 282 Celii, F. G., 140 Kaneko, R., 256, 262 Schumacher, D., 245 Chan, K. K., 232 Kawarada, M., 164 Sehmbey, M. S., 25 Chang, H.-M., 127 Khan, I., 274 Seth, J., 251 Chang, J. M., 91, 96 Kim, J. W., 104 Shing, Y. H., 150 Chen, H., 169 Kirpilenko, G., 274 Shiomi, H., 63 Cheng, D. G., 220 Kupfer, H., 245 Silva, S. R. P., 232 Chow, L. C., 25 Kurihara, K., 164 Skotheim, T. A., 274 Collins, C. B., 216 Kurokawa, H., 240 Sleptsov, V. V., 226 Srivatsa, A. R., 274 Das, K., 19 Landstrass, M. I., 206 Stevenson, D. A., 63 Davanloo, F., 216 Lee, S. Y., 56 Sun, J. B., 220 David, M., 251 Lee, T. J., 216 Sun, Y.-N., 137 Dennig, P. A., 63 Li, J.-Q., 137 DiGregorio, J., 169 Lu, F. X., 220 Tokura, H., 43, 49 Dillon, R. O., 169 Tzeng, Y., 30, 35, 91 Dorfman, V. F., 267, 274 Mitani, T., 240 Dreifus, D. L., 19 Miyake, S., 256, 262 Venkatesan, V., 19 Miyamoto, T., 262 Elinson, V. M., 226 Miyata, K., 19 Watanabe, S., 262 Ellis, C., 56 Morrish, A., 81 Wei, J., 30, 91 Ermakov, M. G., 226 Moyer, M. D., 206 Weiner, A. M., 201 Ermakova, O. N., 226 Murakawa, M., 262 White, Jr., D., 140 Eun, K. Y., 104, 156 Mihling, I., 245 Wu, J.-J., 127 Farnsworth, B. C., 180 Nakaue, H., 240 Yang, B. X., 220 Feng, Z., 35 Nielsen, M. L., 169 Yang, C.-F., 49 Field, J. E., 35 Ye, R. Z., 220 Furtak, T., 169 Ohtake, N., 112 Yonezawa, T., 240 O’Neil, D., 180 Yoon, D. N., 104 Gasworth, S. M., 186 Yoshikawa M., 43, 49, 112 Glass, J. T., 19 Padiyath, R., 251 Yoshio, H., 240 Glesener, J., 81 Pais, M. R., 25 You, J. H., 216 Glumac, N. G., 122 Park, H., 216 Yu, S. C., 133 Gold, C. J., 169 Pehrsson, P. E., 81 Yu, W. X., 220 Goodwin, D. G., 122 Perov, P. I., 226 Yun, H.-Z., 137 Goto, Y., 164 Phillips, R., 30 Groot, P., 282 Plano, M. A., 206 Zhang, H., 274 Thin Solid Films, 212 (1992) 298-300 Subject Index of Volume 212 Adhesion study on the polishing of chemically vapour deposited diamond characterization of polycrystalline diamond thin films grown on film, 49 various substrates, 96 Chloride mechanical and adhesion properties of amorphic diamond films, low hydrogen content diamond-like carbon coatings for KCl 216 optics for high power industrial CO, lasers, 220 Amorphous materials Coatings electrical and photoelectrical characteristics of heterostructures microtribological properties and potential applications of hard, with amorphous carbon films, 226 lubricating coatings, 256 preparation and properties of amorphous carbon and hydrocar- Contacts bon films, 245 review of the electrical characteristics of metal contacts on diamond, 19 Boron ion implantation and diamond: some recent results on growth Deposition process and doping, 1|1 plasma deposited carbon films as a possible means for divertor Boron nitride repair, 282 tribological study of cubic boron nitride film, 262 strain in CVD diamond films: effects of deposition variables, 173 thermodynamic and experimental study of diamond deposition Carbon from a CH,—H, gas mixture, 104 applications of diamond-like carbon films to electronic compo- Deposition processes nents, 240 diamond synthesis in a low-pressure flat flame, 122 effect of diluent gases added during deposition on the etching growth of diamond film by plug-flow flat flame method, 127 characteristics of diamond-like carbon films, 251 preparation and properties of amorphous carbon and hydrocar- electrical and photoelectrical characteristics of heterostructures bon films, 245 with amorphous carbon films, 226 electronic properties of semiconducting diamond-like carbon- Electrical devices diamond, 232 applications of diamond-like carbon films to electronic compo- low hydrogen content diamond-like carbon coatings for KCl nents, 240 optics for high power industrial CO, lasers, 220 Electrical properties microtribological properties and potential applications of hard, review of the electrical characteristics of metal contacts on lubricating coatings, 256 diamond, 19 plasma deposited carbon films as a possible means for divertor diamond-like nanocomposites (DLN), 267 repair, 282 electrical and photoelectrical characteristics of heterostructures preparation and properties of amorphous carbon and hydrocar- with amorphous carbon films, 226 bon films, 245 electronic properties of semiconducting diamond-like carbon- Chemical vapour deposition diamond, 232 chemical vapor deposition diamond nucleation induced by sp? ion implantation and diamond: some recent results on growth carbon on unscratched silicon, 81 and doping, 11 deposition of diamond films with controlled nucleation and Electron spin deposition growth using hot filament CVD, 91 influence of substrate treatments on diamond thin film nucle- diamond growth on a (100)-type step, 193 ation, 63 diamond growth rates vs. acetylene concentrations, 201 Epitaxy diamond IR optical coatings by hot filament chemical vapor first-order Raman scattering in homoepitaxial chemical vapor deposition, 137 deposited diamond at elevated temperatures, 206 first-order Raman scattering in homoepitaxial chemical vapor Etching deposited diamond at elevated temperatures, 206 effect of diluent gases added during deposition on the etching influence of substrate treatments on diamond thin film nucle- characteristics of diamond-like carbon films, 25] ation, 63 model for the hydrogen atom developed in a microwave plasma Fourier transform infrared spectroscopy jet under diamond synthesis conditions, 186 high quality flame-deposited diamond films for IR optical win- nucleation effects and characteristics of diamond film grown by dows, 30 arc discharge plasma jet chemical vapor deposition, 112 nucleation of chemically vapor deposited diamond on platinum Graphite and nickel substrates, 68 plasma deposited carbon films as a possible means for divertor smoothing of chemically vapour deposited diamond films by ion repair, 282 beam irradiation, 43 Growth mechanisms solid particle impact of CVD diamond films, 35 diamond growth rates vs. acetylene concentrations, 201 strain in CVD diamond films: effects of deposition variables, 173 growth of diamond films on stainless steel, 169 structural characteristics of diamond films prepared with thermal habit modification of gas phase synthesized diamond particles in chemical vapor deposition processes, 133 the C-H-—O system, 156 studies of stress related issues in microwave CVD diamond on model for the hydrogen atom developed in a microwave plasma <100>» silicon substrates, 180 jet under diamond synthesis conditions, 186 Growth mechanisms (continued) Physical vapour deposition nucleation of chemically vapor deposited diamond on platinum preparation and properties of amorphous carbon and hydrocar- and nickel substrates, 68 bon films, 245 thermodynamic and experimental study of diamond deposition Plasma processing from a CH,—H, gas mixture, 104 deposition of smooth, oriented diamond films using microwave plasma chemical vapor deposition, 140 Hardness formation of functionally gradient diamond films, 164 mechanical and adhesion properties of amorphic diamond films, low-pressure microwave plasma nucleation and deposition of 216 diamond films, 150 Heat treatment Potassium study of diamond laminated surfaces in evaporative spray cool- low hydrogen content diamond-like carbon coatings for KC] ing, 25 optics for high power industrial CO, lasers, 220 Heterostructures electrical and photoelectrical characteristics of heterostructures Raman spectroscopy with amorphous carbon films, 226 deposition of smooth, oriented diamond films using microwave plasma chemical vapor deposition, 140 Ion bombardment diamond synthesis in a low-pressure flat flame, 122 smoothing of chemically vapour deposited diamond films by ion first-order Raman scattering in homoepitaxial chemical vapor beam irradiation, 43 deposited diamond at elevated temperatures, 206 Ion implantation high quality flame-deposited diamond films for IR optical win- ion implantation and diamond: some recent results on growth dows, 30 and doping, 11 low-pressure microwave plasma nucleation and deposition of diamond films, 150 Lattice parameters diamond properties as a function of isotopic composition, 1 Schottky barrier Luminescence diamond-like nanocomposites: electronic transport mechanisms low-pressure microwave plasma nucleation and deposition of and some applications, 274 diamond films, 150 Sensors thin film diamond microstructures, 56 Nanostructures Silicon diamond-like nanocomposites (DLN), 267 microtribological properties and potential applications of hard, diamond-like nanocomposites: electronic transport mechanisms lubricating coatings, 256 and some applications, 274 Stress Nucleation mechanical and adhesion properties of amorphic diamond films, chemical vapor deposition diamond nucleation induced by sp? 216 carbon on unscratched silicon, 81 strain in CVD diamond films: effects of deposition variables, 173 deposition of diamond films with controlled nucleation and studies of stress related issues in microwave CVD diamond on growth using hot filament CVD, 91 <100» silicon substrates, 180 influence of substrate treatments on diamond thin film nucle- Structural properties ation, 63 structural characteristics of diamond films prepared with thermal low-pressure microwave plasma nucleation and deposition of chemical vapor deposition processes, 133 diamond films, 150 Surface defects nucleation effects and characteristics of diamond film grown by chemical vapor deposition diamond nucleation induced by sp? arc discharge plasma jet chemical vapor deposition, 112 carbon on unscratched silicon, 81 nucleation of chemically vapor deposited diamond on platinum diamond growth on a (100)-type step, 193 and nickel substrates, 68 Surface morphology studies of stress related issues in microwave CVD diamond on a study of diamond laminated surfaces in evaporative spray <100> silicon substrates, 180 cooling,2 5 thermodynamic and experimental study of diamond deposition characterization of polycrystalline diamond thin films grown on from a CH,—H, gas mixture, 104 various substrates, 96 deposition of diamond films with controlled nucleation and Optical coatings growth using hot filament CVD, 91 diamond IR optical coatings by hot filament chemical vapor deposition of smooth, oriented diamond films using microwave deposition, 137 plasma chemical vapor deposition, 140 high quality flame-deposited diamond films for IR optical win- diamond synthesis in a low-pressure flat flame, 122 dows, 30 formation of functionally gradient diamond films, 164 low hydrogen content diamond-like carbon coatings for KCl growth of diamond film by plug-flow flat flame method, 127 optics for high power industrial CO, lasers, 220 growth of diamond films on stainless steel, 169 habit modification of gas phase synthesized diamond particles in Optical properties the C-H-—O system, 156 diamond IR optical coatings by hot filament chemical vapor nucleation effects and characteristics of diamond film grown by deposition, 137 arc discharge plasma jet chemical vapor deposition, 112 diamond properties as a function of isotopic composition, | plasma deposited carbon films as a possible means for divertor low hydrogen content diamond-like carbon coatings for KCl repair, 282 optics for high power industrial CO, lasers, 220 solid particle impact of CVD diamond films, 35 300 Surface structure high quality flame-deposited diamond films for IR optical win- thin film diamond microstructures, 56 dows, 30 strain in CVD diamond films: effects of deposition variables, 173 Tribology _ studies of stress related issues in microwave CVD diamond on microtribological properties and potential applications of hard, <100> silicon substrates, 180 lubricating coatings, 256 study on the polishing of chemically vapour deposited diamond X-ray photoelectron spectroscopy film, 49 nucleation of chemically vapor deposited diamond on platinum tribological study of cubic boron nitride film, 262 and nickel substrates, 68 X-ray diffraction deposition of smooth, oriented diamond films using microwave plasma chemical vapor deposition, 140