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Science and Technology of Integrated Ferroelectrics: Selected Papers from Eleven Years of the Proceedings of the International Symposium of Integrated Ferroelectronics PDF

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SCIENCE AND TECHNOLOGY OF INTEGRATED FERROELECTRICS Ferroelectricity and Related Phenomena Editor: George W. Taylor, Princeton Resources, Princeton, New Jersey, USA Associate Editor: Lev A. Shuvalov, Institute of Crystallography, Russian Academy of Sciences, Moscow, Russia Volume 1 An Introduction to the Physics of Ferroelectrics T. Mitsui, I. Tatsuzaki and E. Nakamura Volume 2 Sourcebook of Pyroelectricity S.B. Lang Volume 3 Ferroelectrics and Related Materials G.A. Smolenskii, V.A. Bokov, V.A. Isupov, N.N. Krainik, R.E. Pasynkov and A.I. Sokolov Volume 4 Piezoelectricity Edited by G.W. Taylor, J.J. Gagnepain, T.R. Meeker, T. Nakamura and L.A. Shuvalov Volume 5 Medical Applications of Piezoelectric Polymers Edited by Pierre M. Galletti, Danilo E. De Rossi and Aime S. De Reggi Volume 6 Defects and Structural Phase Transitions A. P. Levanyuk and A.S. Sigov Volume 7 Ferroelectric Liquid Crystals: Principles, Properties and Applications J.W. Goodby, R. Blinc, N.A. Clark, S.T. Lagerwall, M.A. Osipov, S.A. Pikin, T. Sakurai, K. Yoshino and B. Zeks Volume 8 The Photovoltaic and Photorefractive Effects in Noncentrosymmetric Materials B. I. Sturman and V.M. Fridkin Volume 9 Microwave Dielectric Spectroscopy of Ferroelectrics and Related Materials J. Grigas Volume 10 Ferroelectric Thin Films: Synthesis and Basic Properties Edited by C. Paz de Araujo, J.F. Scott and G.W. Taylor Volume 11 Science and Technology of Integrated Ferroelectrics: Selected Papers from Eleven Years of the Proceedings of the International Symposium on Integrated Ferroelectrics Edited by C. Paz de Araujo, O. Auciello, R. Ramesh, and G. W. Taylor This book is part of a series. The publisher will accept continuation orders which may be cancelled at any time and which provide for automatic billing and shipping of each title in the series upon publication. Please write for details. Science and Technology of Integrated Ferroelectrics Selected Papers from Eleven Years of the Proceedings of the International Symposium on Integrated Ferroelectrics Edited by Carlos Paz de Araujo University of Colorado at Colorado Springs, CO, USA Symetrix Corporation, Colorado Springs, CO, USA Orlando Auciello Argonne National Laboratory Materials Science Division Argonne, IL, USA Ramamoorthy Ramesh University of Maryland Department of Materials and Nuclear Engineering College Park, MD, USA George W. Taylor Princeton Resources Inc. Princeton, NJ, USA Boca Raton London New York CRC Press is an imprint of the Taylor & Francis Group, an informa business First published 2000 by Gordon and Breach Science Publisher Published 2018 by CRC Press Taylor & Francis Group 6000 Broken Sound Parkway NW, Suite 300 Boca Raton, FL 33487-2742 © 2000 by Taylor & Francis Group, LLC CRC Press is an imprint of Taylor & Francis Group, an lnforma business No claim to original U.S. Government works ISBN 13: 978-90-5699-704-5 (hbk) This book contains information obtained from authentic and highly regarded sources. Reasonable efforts have been made to publish reliable data and information, but the author and publisher cannot assume responsibility for the validity of all materials or the consequences of their use. The authors and publishers have attempted to trace the copyright holders of all material reproduced in this publication and apologize to copyright holders if permission to publish in this form has not been obtained. If any copyright material has not been acknowledged please write and let us know so we may rectify in any future reprint. Except as permitted under U.S. Copyright Law, no part of this book may be reprinted, reproduced, transmitted, or utilized in any form by any electronic, mechanical, or other means, now known or hereafter invented, including photocopying, microfilming, and recording, or in any information storage or retrieval system, without written permission from the publishers. For permission to photocopy or use material electronically from this work, please access www. copyright.com (http://www.copyright.com/) or contact the Copyright Clearance Center, Inc. (CCC), 222 Rosewood Drive, Danvers, MAO 1923, 978-7 50-8400. CCC is a not-for-profit organization that provides licenses and registration for a variety of users. For organizations that have been granted a photocopy license by the CCC, a separate system of payment has been arranged. Trademark Notice: Product or corporate names may be trademarks or registered trademarks, and are used only for identification and explanation without intent to infringe. Visit the Taylor & Francis Web site at http://www.taylorandfrancis.com and the CRC Press Web site at http://www.crcpress.com British Library Cataloguing in Publication Data Science and technology of integrated ferroelectrics: selected papers from eleven years of the International Symposium ofFerroelectrics Proceedings. - (F erroelectricity and related phenomena ; v. 11) I. Ferroelectric thin films 2. Ferroelectricity I. Araujo, Carlos Paz de II. International Symposium of F erroelectrics Proceedings) 537.2'448 DEDICATED TO: Professor Rainer Zuleeg Technical Program Chair, International Symposium on Integrated Ferroelectrics 1994 Guest Editor, the international journal, Integrated Ferroelectrics, March 1994 Book Review Editor, the international journal, Integrated Ferroelectrics, from 1992 to 1999 and Alona S. Miller Symposium Coordinator, International Symposium on Integrated Ferroelectrics, 1989 to 1998 ACKNOWLEDGMENTS The authors would like to thank Ms. Kerry Baugh for her work in making this project possible. We also would like to thank the authors of the original papers published in the last 11 years of the international journal Integrated Ferroelectrics. CONTENTS Series Editor’s Foreword xiii G.W. Taylor Preface xv C. Paz de Araujo, O. Auciello, R. Ramesh and G.W. Taylor Introduction: Science and Technology of Ferroelectric Filins and Heterostructures for Non-Volatile Ferroelectric Memories: Past Eleven Years and the Future xvii C. Paz de Araujo, O. Auciello and R. Ramesh 1. Processing and Parameters of Sol-Gel PZT Thin-Films for GaAs Memory Applications 1 S.K. Dey and R. Zuleeg 2. Pulsed Laser Deposition of Oriented PbZr^Ti^Oa 13 K.S. Grabowski, J.S. Horwitz and D.B. Chrisey 3. Processing-Structure Relations for Ferroelectric Thin Films Deposited by Ion Beam Sputter Deposition 29 A. Kingon, M. Ameen, O. Auciello, K. Gifford, H. Al-Shareef T. Graettinger, S.-H. Rou and P. Hren 4. Recent Results on Switching, Fatigue and Electrical Characterization of Sol-Gel Based PZT Capacitors 45 B. M. Melnick, C.A. Paz de Araujo, L.D. McMillan, D.A. Carver and J.F. Scott 5. Microscopic Modeling of Thin-Film Ferroelectrics: Fatigue 61 P.D. Beale and H.M. Duiker 6. A Circuit Model for a Thin Film Ferroelectric Memory Device 67 A.K. Kulkami, G.A. Rohrert S. Narayan and L.D. McMillan 1. Radiation Damage in Ferroelectric Thin-Film Memories 79 J.F. Scott, C.A. Paz de Araujo and L.D. McMillan 8. Integrated Ferroelectrics 83 C. A. Paz de Araujo and G.W. Taylor vii viii CONTENTS 9. Ferroelectric PbZr0<2Ti0<gO3 Thin Films on Epitaxial Y-Ba-Cu-O 97 R. Ramesh, A. Inam, W.K. Chan, B. Wilkens, F. Tillerot, T. Sands, J.M. Tarascon, J. Bullington and J. Evans 10. Statistical Theory of Fatigue in Ferroelectric Devices 105 C.A. Paz de Araujo, R. Zuleeg, T. Mihara, H. Watanabe, A. Carrico, L.D. McMillan and J.F. Scott 11. Sol-Gel Derived Ferroelectric Thin Films in Silicon Micromachining 123 C. -C. Hsueh, T. Tamagawa, C. Ye, A. Helgeson and D. L. Polla 12. Theory of Conduction and Breakdown in Perovskite Thin Films 135 R. Waser and M. Klee 13. Numerical Analysis of Ferroelectric Characteristics for Memory Use hy Using a Lattice Model 153 M. Omura, H. Adachi and Y Ishibashi 14. Anomalous Remanent Polarization in Ferroelectric Capacitors 163 N. E. Abt, R. Moazzami and Y Nissan-Cohen 15. Chemical Aspects of Ph-Zr-Ti Oxide Thin Film Syntheses by PE-MOCVD Below 500°C 175 W.T. Petuskey, D.A. Richardson and S.K. Dey 16. Epitaxial Lao.5Sr0^Co03 Electrode Films for Ferroelectric Device Applications 203 J.T. Cheung, P.E.D. Morgan, R. Neugoankar and M. Goorsk 17. Conducting Oxide Electrodes for Ferroelectric Films 215 C.K. Kwok, D.P. Vijay, S.B. Desu, N.R. Parikh and E.A. Hill 18. Deposition of Ba1_xSrJCTi03 and SrTi03 via Liquid Source CVD (LSCVD) for ULSI DRAMs 225 L.D. McMillan, M. Huffman, T.L. Roberts, M.C. Scott and C.A. Paz de Araujo CONTENTS IX 19. A Theory of Polarization Reversals in Finite Systems 231 Y. lshibashi 20. Electrochemical Models of Failure in Oxide Perovskites 235 S. B. Desu and I.K. Yoo 21. Defect Chemistry and Transport Properties of PbCZr^Ti^Oa 247 M.V. Raymond and DM. Smyth 22. Large-Area Growth of Pb(Zr,Ti)03 Thin Films by MOCVD 257 T. Shiosaki, M. Fujimoto, M. Shimizu, M. Fukagawa, K. Nakaya and E. Tanikawa 23. Plasma Etching of PLZT: Review and Future Prospects 265 C.B. Fleddermann 24. Ferroelectric La-Sr-Co-O/Pb-La-Zr-Ti-O/La-Sr-Co-O Heterostructures on Silicon 275 J. Lee, R. Ramesh, B. Dutta, T.S. Ravi, T. Sands and V.G. Keramidas 25. Fatigue and Retention of Pb(Zr0^3Tio.47)03 Thin Film Capacitors with Pt and Ru02 Electrodes 285 H.N. Al-Shareef, K.R. Bellur, O. Auciello and A.I. Kingon 26. 256Kb Ferroelectric Nonvolatile Memory Technology for 1T/1C Cell with 100ns Read/Write Time at 3V 297 T. Sumi, N. Moriwaki, G. Nakane, T. Nakakuma, Y. Judai, Y. Uemoto, Y. Nagano, S. Hayashi, M. Azuma, T. Otsuki, G. Kano, J.D. Cuchiaro, M.C. Scott, L.D. McMillan and C. A. Paz de Araujo 27. Study on Ferroelectric Thin Films for Application to NDRO Non-Volatile Memories 311 Y. Nakao, T. Nakamura, A. Kamisawa and H. Takasu 28. Integrated Ferroelectric Microelectromechanical Systems (MEMS) 323 D. L. Polla and P.J. Schiller

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