Contents Preface Conference Organization 1. Si homo- and heteroepitaxy 1.1. Theoretical aspects Stress-induced roughening in epitaxial growth J. Tersoff Theory of surfactant-mediated growth on semiconductor surfaces E. Kaxiras and D. Kandel The physical origin of the two-dimensional towards three-dimensional coherent epitaxial Stranski-Krastanov transi- tion P. Miiller and R. Kern Microstructural and elastic properties of silicon—germanium—carbon alloys P.C. Kelires 1.2. Experimental aspects and characterization methods in semiconductor growth Growth and characterization of Ge, _ ,C ,/Si superlattice structures on Si substrates K. Brunner, K. Eberl, W. Winter and E. Bugiel Gas source molecular beam epitaxy of B-SiC on Si substrates K. Zekentes, N. Bécourt, M. Androulidaki, K. Tsagaraki, J. Stoemenos, J.M. Bluet, J. Camassel and J. Pascual Bulk and surface structural properties of Si,_ ,_ ,Ge,C , layers processed on Si(001) by pulsed laser induced epitaxy C. Guedj, J. Boulmer, D. Bouchier, C. Clerc, G. Calvarin, C. Godet, P. Roca i Cabarrocas, F. Houze and D. Mencaraglia Sputter epitaxy of step-graded Si, Ge ,/ Si(001): evolution of defects and surface morphology P. Sutter, B. Végeli, E. Miiller, H. von Kanel and A. Dommann An electrostatic Si e-gun and a high temperature elemental B source for Si heteroepitaxial growth F. Scarinci, A. Casella, $. Lagomarsino, M. Fiordelisi, P. Strappaveccia, N. Gambacorti, M.G. Grimaldi and Li Ying-Xue Laser-induced integrated processing for heteroepitaxial Si ,Ge,, _ ,, alloys S. Chiussi, P. Gonzalez, B. Leén, R. Larciprete, P. Willmott, S. Martelli, C. Cesile and E. Borsella Real-time optical monitoring of heteroepitaxial growth processes on Si under pulsed chemical beam epitaxy conditions N. Dietz, U. Rossow, D.E. Aspnes and K.J. Bachmann UHV-CVD Ge /Si(100) heteroepitaxy monitored by in situ ellipsometry R. Larciprete, S. Cozzi, E. Masetti and M. Montecchi STM studies of Ge-Si thin layers epitaxially grown on Si(111) N. Motta, A. Sgarlata, M. De Crescenzi and J. Derrien X-ray standing wave study of Si/Ge superlattices P. Castrucci, S. Lagomarsino, P. Calicchia and A. Cedola Effects of Si(100) tilting angle and prelayer conditions on GaAs /Si heterostructures A. Georgakilas, Ch. Papavassiliou, G. Constantinidis, K. Tsagaraki, H. Krasny, E. Léchtermann and P. Panayotatos Contents Strain relaxation through islands formation in epitaxial SiGe thin films G. Barucca, L. Lucchetti, G. Majni, P. Mengucci, R. Murri and N. Pinto RHEED investigations of surface diffusion on Si(001) J.F. Niitzel, P. Brichzin and G. Abstreiter The role of low temperature growth defects for the stability of strained Si/Si,_ ,Ge, heterostructures H.H. Radamson, W.-X. Ni and G.V. Hansson Electron tunneling through chemical oxide of silicon T. Hattori, K. Watanabe, M. Ohashi, M. Matsuda and M. Yasutake Electroreflectance spectroscopy of strained Si,_ ,Ge, layers on silicon T. Ebner, K. Thonke, R. Sauer, F. Schaffler and H.J. Herzog Ge /Si(100) heterostructures: a photoemission and low-energy yield spectroscopy investigation L. Di Gaspare, G. Capellini, M. Sebastiani, C. Chudoba and F. Evangelisti Segregation of n-dopants on SiGe surfaces J.F. Niitzel, M. Holzmann, P. Schittenhelm and G. Abstreiter XPD study of atomic intermixing at the Ge /Si(001) interface I. Davoli, R. Gunnella, P. Castrucci, N. Pinto, R. Bernardini and M. De Crescenzi Influence of interdiffusion and surfactants on Si /SiGe heterointerfaces H.P. Zeindl, S. Nilsson, U. Jagdhold, J. Klatt, R. Kurps, D. Kriiger and E. Bugiel Substrate effect on the structure and properties of electrodeposited CdSe and Cd(Se, Te) coatings M. Bouroushian, C. Kollia, Z. Loizos, N. Spyrellis and G. Maurin An infrared study of Ge* implanted SiC T.T. Zorba, C.L. Mitsas, I.D. Siapkas, G.Z. Terzakis, D.I. Siapkas, Y. Pacaud and W. Skorupa Electrical and photoelectrical characterization of diamond-on-silicon structures S. Salvatori, R. Vincenzoni, M.C. Rossi, F. Galluzzi, F. Pinzari, G. Mattei, E. Cappelli and P. Ascarelli Properties of expitaxial Pb, _ Sn, Se on CaF, covered Si(111) substrates P. Miller, A. Fach, J. John, J. Masek, C. Paglino and H. Zogg Schottky diodes on Si,_ ,_ ,Ge,C , alloys: effect of the C-incorporation M. Mamor, F. Meyer, D. Bouchier, G. Vialaret, E. Finkman, S. Bodnar and J.L. Regolini 2. Silicides Effect of oxygen on the growth of epitaxial ErSi,_ , films on Si by the reactive deposition technique M.G. Grimaldi, S. Ravesi, C. Spinella and Yan Xinshui Oxidation of thin erbium and erbium silicide overlayers in contact with silicon oxide films thermally grown on silicon S. Kennou, S. Ladas, M.G. Grimaldi, T.A. Nguyen Tan and J.Y. Veuillen Properties of semiconducting rhenium silicide thin films grown epitaxially on silicon (111) I. Ali, P. Muret and T.A. Nguyen Tan High crystalline quality erbium silicide films on (100) silicon, grown in high vacuum G. Kaltsas, A. Travlos, A.G. Nassiopoulos, N. Frangis and J. Van Landuyt HRTEM characterization of the NiSi, growth into the Si(111) surface M. Hietschold, S. Schulze, U. Falke, F. Fenske and W. Wolke The effect of silicon substrate orientation on the formation of Gd-silicide phases Gy. Molnar, G. Peté, E. Zsoldos, Z.E. Horvath and N.Q. Khanh Electron microscopy characterisation of erbium silicide-thin films grown on a Si(111) substrate N. Frangis, G. Van Tendeloo, J. Van Landuyt, P. Muret and T.T.A. Nguyen Optical properties of B-FeSi, films grown on Si substrates with different degree of structural perfection H. Lange, W. Henrion, B. Selle, G.-U. Reinsperger, G. Oertel and H. von Kinel Contents Photoelectric and electrical responses of several erbium silicide /silicon interfaces P. Muret, T.T.A. Nguyen, N. Frangis, G. Van Tendeloo and J. Van Landuyt Optical and electrical characterization of high quality B-FeSi, thin films grown by solid phase epitaxy D.H. Tassis, C.L. Mitsas, T.T. Zorba, M. Angelakeris, C.A. Dimitriadis, O. Valassiades, D.1. Siapkas and G. Kiriakidis Ion beam synthesis of heteroepitaxial erbium silicide layers M.F. Wu, A. Vantomme, H. Pattyn, G. Langouche and H. Bender 3. Fast electronic devices Silicium germanium heterodevices E. Kasper A manufacturable poly-emitter graded-SiGe HBT technology for wireless and mixed-signal applications D. Nguyen-Ngoc, D.A. Sunderland, D.C. Ahigren, S.J. Jeng, M.M. Gilbert, J.C. Malinowski, K.T. Schonen- berg, K.S. Stein, B.S. Meyerson and D.L. Harame Conduction band discontinuity and electron mobility in a strained Si /SiGe heterostructure L. Garchery, I. Sagnes and P.A. Badoz : Heterojunction diodes nGaAs/pSi with ideal characteristics E. Aperathitis, M. Kayiambaki, V. Foukaraki, G. Halkias, P. Panayotatos and A. Georgakilas Electrical characterisation of SiGe heterojunction bipolar transistors and Si pseudo-HBTS O. De Barros, B. Le Tron, R.C. Woods, G. Giroult-Matlakowski, G. Vincent and G. Brémond On interfaces and the phonon and electron confinement in Ge /Si multiple quantum wells R. Manor, O. Brafman and J.C. Bean p-channel SiGe heterostructures for field effect applications T.E. Whall Transport in silicon /germanium nanostructures M. Holzmann, D. Tébben and G. Abstreiter Capture, storage, and emission of holes in Si/Si,_ ,Ge ,/Si QW’s for the determination of the valence band offset by DLTS O. Chretien, R. Apetz, L. Vescan, A. Souifi and H. Liith Uniaxial stress effects on a Si/Si,_ ,Ge, double-barrier resonant tunnelling structure studied by magnetotunnelling spectroscopy U. Gennser, A. Zaslavsky, D.A. Griitzmacher, P. Gassot and J.C. Portal Base currents of Si/SiGe/Si HBT in dependence on the processing conditions D. Knoll, G. Fischer, K.E. Ehwald, B. Heinemann, P. Schley, H. Zeindl, B. Tillack, T. Morgenstern and A. Wolff Vertical 100 nm Si-p channel JFET grown by selective epitaxy W. Langen, L. Vescan, R. Loo, H. Liith and P. KordoS Bohm trajectories and their potential use for the Monte Carlo simulation of resonant tunnelling diodes J. Sufié, X. Oriols, F. Martin and X. Aymerich Operation of SiGe channel heterojunction p-M OSFET P. Dollfus, F.-X. Musalem, S. Galdin and P. Hesto 4. Photo- and electroluminescence properties of heterostructures Formation and optical properties of SiGe /Si quantum structures Y. Shiraki, H. Sunamura, N. Usami and S. Fukatsu Photocurrent spectroscopy measurements of Si-Ge alloys and superlattices L. Colace, A. DiVergilio, S. Vaidyanathan, T.P. Pearsall, H. Presting and E. Kasper Contents Important defect aspects in optoelectronic applications of Si- and SiGe /Si-heterostructures W.M. Chen, I.A. Buyanova, A. Henry, W.-X. Ni, G.V. Hansson and B. Monemar Optical anisotropies in strained Si/SiGe systems J. Olajos, J. Engvall, H.G. Grimmeiss, H. Kibbel and H. Presting Direct gap Si/Ge superlattices strained along the [110] and [111] directions C. Tserbak and G. Theodorou Influence of growth conditions on the formation of deep photoluminescence bands in MBE-grown Si layers and SiGe /Si quantum structures LA. Buyanova, W.M. Chen, A. Henry, W.-X. Ni, G.V. Hansson and B. Monemar Intense photoluminescence observed in modulation doped Si/SiGe quantum well structures W.-X. Ni, LA. Buyanova, A. Henry, W.M. Chen, K.B. Joelsson, G.V. Hansson and B. Monemar Influence of scattering on internal photoemission in heterostructures M. Schmidt, M. Brauer and V. Hoffmann Selection rules for light scattering by folded acoustic phonons in low-index Si-based superlattices E. Anastassakis and Z.V. Popovic Si, ,Ge,,/Si(001) layers under external uniaxial stress: photoluminescence studies U. Mantz, B. Steck, K. Thonke, R. Sauer, F. Schiaffler and H.-J. Herzog Luminescent waveguide structures deposited from liquid organosilane vapour sources W. Bauhofer and D. Riiter Optical and electrical properties of amorphous silicon-oxide with visible room temperature photoluminescence M.C. Rossi, M.S. Brandt and M. Stutzmann Room temperature electroluminescence of Er-implanted silicon diodes grown by MBE M. Jaumann, J. Stimmer, P. Schittenhelm, J.F. Niitzel, G. Abstreiter, E. Neufeld, B. Hollander and Ch. Buchal 5. Far-infrared applications Infrared spectroscopy in p-type SiGe /Si quantum wells J.M. Berroir, S. Zanier, Y. Guldner, J.P. Vieren, I. Sagnes, Y. Campidelli and P.A. Badoz Optical spectra and recombination in SiGe /Si heterostructures for infrared applications E. Corbin, C.J. Williams and M. Jaros Photo-induced intersubband absorption in Si/Si,_ ,Ge, quantum wells P. Boucaud, L. Wu, F.H. Julien, J.-M. Lourtioz, I. Sagnes, Y. Campidelli and P.-A. Badoz IR-sensor array fabrication in Pb, _ ,Sn ,Se-on-Si heterostructures J. John, A. Fach, J. Masek, P. Miiller, C. Paglino and H. Zogg 6. Nanostructures Theory of silicon nanostructures A. Zunger and L.-W. Wang Recent progress of heterostructure technologies for novel silicon devices M. Miyao, K. Nakagawa, H. Nakahara, Y. Kiyota and M. Kondo Photoluminescence and electroluminescence study of Si-Sig Gey , quantum dots Y.S. Tang, W.-X. Ni, C.M. Sotomayor Torres and G.V. Hansson Characterization of light emitting silicon nanopillars produced by lithography and etching S. Grigoropoulos, A.G. Nassiopoulos, A. Travlos, D. Papadimitriou, $. Kennou and S. Ladas Intense photoluminescence from strained SiGe sub-100 nm wires selectively grown on Si by LPCVD A. Souifi, L. Vescan, R. Loo, P. Gartner, C. Dieker, A. Hartmann and H. Liith Strain relaxation and self-organizing MBE-growth of local SiGe-structures T. Rupp, I. Eisele and D.J. Gravesteijn Contents 7. Porous structures Network dimensionality of porous Si and Ge S. Bayliss, Q. Zhang and P. Harris Luminescence in porous silicon: the role of confinement and passivation S. Ossicini, L. Dorigoni and O. Bisi Electroluminescent porous silicon p—n junction using polycrystalline silicon films F. Chane-Ché-Lai, C. Beau, D. Briand and P. Joubert Atomic force microscopy study on the surface structure of oxidized porous silicon T.F. Young, 1.W. Huang, Y.L. Yang, W.C. Kuo, IM. Jiang, T.C. Chang and C.Y. Chang Chemical nature of the luminescent centre in fresh and aged porous silicon layers S. Gardelis, U. Bangert, B. Hamilton, R.F. Pettifer, D.A. Hill, R. Keyse and D. Teehan Interpretation of the dielectric function of porous silicon layers U. Rossow, U. Frotscher, C. Pietryga, W. Richter and D.E. Aspnes EELS investigation of luminescent nanoporous p-type silicon I. Berbezier, J.M. Martin, C. Bernardi and J. Derrien Positron / positronium annihilation in low dimensional silicon materials Y. Itoh, H. Murakami and A. Kinoshita Spectroscopic and SEM investigations of porous silicon doped with dyes A. Bruska, A. Chernook, M. Hietschold and C. von Borczyskowski Different morphology aspects of n-type porous silicon E.Yu. Buchin, A.B. Churilov and A.V. Prokaznikov Progress towards silicon optoelectronics using porous silicon technology L.T. Canham, T.I. Cox, A. Loni and A.J. Simons Author index Subject index