Editedby YuanLinandXinChen AdvancedNanoDepositionMethods EditedbyYuanLinandXinChen Advanced Nano Deposition Methods Editors AllbookspublishedbyWiley-VCHare carefullyproduced.Nevertheless,authors, Prof.YuanLin editors,andpublisherdonotwarrantthe UniversityofElectronicScience informationcontainedinthesebooks, andTechnologyofChina includingthisbook,tobefreeoferrors. StateKeyLaboratoryofElectronicThin Readersareadvisedtokeepinmindthat filmsandIntegratedDevices statements,data,illustrations,procedural No.4,Section2,NorthJiansheRoad detailsorotheritemsmayinadvertently Chengdu beinaccurate. Sichuan610054 PRChina LibraryofCongressCardNo.:appliedfor Prof.XinChen BritishLibraryCataloguing-in-Publication EastChinaUniversityofScienceand Data Technology Acataloguerecordforthisbookisavail- 130MeilongRoad ablefromtheBritishLibrary. 200237Shanghai China Bibliographicinformationpublishedbythe DeutscheNationalbibliothek Cover TheDeutscheNationalbibliothek LAGUNADESIGN@GettyImages liststhispublicationintheDeutsche Nationalbibliografie;detailed bibliographicdataareavailableonthe Internetat<http://dnb.d-nb.de>. ©2016ChemicalIndustryPress.All rightsreserved.PublishedbyWiley-VCH VerlagGmbH&Co.KGaA,Boschstr.12, 69469Weinheim,Germany,underexclu- sivelicensegrantedbyCIPforallmedia andlanguagesexcludingChineseand throughouttheworldexcludingMainland China,andwithnon-exclusivelicensefor electronicversionsinMainlandChina. Allrightsreserved(includingthoseof translationintootherlanguages).Nopart ofthisbookmaybereproducedinany form – byphotoprinting,microfilm,or anyothermeans – nortransmittedor translatedintoamachinelanguage withoutwrittenpermissionfromthe publishers.Registerednames,trademarks, etc.usedinthisbook,evenwhennot specificallymarkedassuch,arenottobe consideredunprotectedbylaw. PrintISBN:978-3-527-34025-5 ePDFISBN:978-3-527-69645-1 ePubISBN:978-3-527-69647-5 MobiISBN:978-3-527-69646-8 oBookISBN:978-3-527-69640-6 Typesetting SPiGlobal,Chennai,India PrintingandBinding Printedonacid-freepaper V Contents ListofContributors XIII 1 PulsedLaserDepositionforComplexOxideThinFilmand Nanostructure 1 ChunruiMaandChonglinChen 1.1 Introduction 1 1.2 PulsedLaserDepositionSystemSetup 2 1.3 AdvantagesandDisadvantagesofPulsedLaserDeposition 3 1.4 TheThermodynamicsandKineticsofPulsedLaserDeposition 3 1.4.1 Laser–MaterialInteractions 4 1.4.2 DynamicsofthePlasma 5 1.4.3 NucleationandGrowthoftheFilmontheSubstrateSurface 5 1.5 MonitoringofGrowthKinetics 8 1.5.1 IntroductionandRHEEDStudies 8 1.5.2 GrowthKineticsStudiesbySurfaceX-rayDiffraction 9 1.6 FundamentalParametersinThinFilmGrowth 10 1.6.1 SubstrateTemperature 10 1.6.2 BackgroundGasPressure 10 1.6.3 LaserFluenceandAblationArea 11 1.6.4 Target–SubstrateDistance 11 1.6.5 Post-Annealing 12 1.6.6 LatticeMisfit 12 1.7 PulsedLaserDepositionforComplexOxideThinFilm Growth 13 1.7.1 PulsedLaserDepositionforSuperconductorThinFilm 14 1.7.2 PulsedLaserDepositionforFerroelectricThinFilms 14 1.7.3 PulsedLaserDepositionforFerromagneticThinFilm 15 1.7.4 PulsedLaserDepositionforMultiferroicsThinFilm 15 1.7.5 InterfaceStrainEngineeringtheComplexOxideThinFilm 16 1.7.5.1 ThicknessEffect 16 1.7.5.2 SubstrateEffect 17 1.7.5.3 Post-Annealing 21 1.8 PulsedLaserDepositionforNanostructureGrowth 23 VI Contents 1.8.1 Self-AssembledNanoscaleStructures 23 1.8.2 GeometricallyOrderedArrays 23 1.9 VariationofPulsedLaserDeposition 24 1.10 Conclusion 24 References 25 2 ElectronBeamEvaporationDeposition 33 ZhongpingWangandZengmingZhang 2.1 Introduction 33 2.2 ElectronBeamEvaporationSystem 35 2.2.1 HeatingPrincipleandCharactersofElectronBeams 35 2.2.1.1 HeatingPrincipleofElectronBeams 35 2.2.1.2 CharactersofElectronBeams 36 2.2.2 EquipmentsofElectronBeamSource 37 2.2.2.1 FilamentandElectronEmission 37 2.2.2.2 ElectronBeamControl 38 2.2.2.3 PowerSupply,Crucibles,andFeedSystems 39 2.2.2.4 SourceMaterials 40 2.2.3 ApplicationofElectronBeamEvaporation 43 2.2.3.1 CoolingofElectronBeamGun 43 2.2.3.2 EvaporationofSourceMaterialsbyElectronBeam 43 2.2.3.3 VacuumDepositionProcessofElectronBeamEvaporation 44 2.2.3.4 AttentionandWarningforElectronBeamEvaporation 45 2.3 CharacterizationofThinFilm 45 2.3.1 SurfaceMorphologybyAFM 46 2.3.2 ThicknessMeasurementbySpectroscopicEllipsometry 47 2.4 Summary 53 Acknowledgments 53 References 53 3 NanostructuresandThinFilmsDepositedwithSputtering 59 WeiqingYang 3.1 Introduction 59 3.2 NanostructureswithSputtering 60 3.2.1 OxideNanostructures 61 3.2.1.1 Needle-ShapedMoO Nanowires 61 3 3.2.1.2 Bi O Nanowires 64 2 3 3.2.2 NitrideNanostructures 65 3.2.2.1 Graphitic-C N NanoconeArray 65 3 4 3.2.2.2 InAlNNanorods 68 3.3 ThinFilmsDepositedwithSputtering 71 3.3.1 MetalAlloyThinFilms 73 3.3.1.1 LaNi AlloyThinFilms 73 5 3.3.1.2 Ni–Mn–InAlloyThinFilms 74 3.3.2 CompositeMetalOxideThinFilms 75 Contents VII 3.3.2.1 BiFeO /BaTiO BilayerThinFilms 75 3 3 3.4 Summary 76 Acknowledgments 77 References 77 4 NanostructuresandQuantumDotsDevelopmentwithMolecular BeamEpitaxy 81 WenHuang 4.1 Introduction 81 4.2 TechnologyofMBE 82 4.2.1 ThePhysicsofMBE 83 4.2.2 MBEGrowthMechanisms 86 4.2.2.1 Two-Dimensional(2D)MBEGrowthMechanism 87 4.2.2.2 Three-Dimensional(3D)MBEGrowthMechanism 88 4.2.2.3 Stranskie–Krastanow3DGrowthMechanism 90 4.3 NanoheterostructuresFabricatedbyMolecularBeam Epitaxy 91 4.3.1 SemiconductingOxideHeterostructuresGrownbyLaserMolecular BeamEpitaxy 91 4.3.2 Strain-InducedMagneticAnisotropyinHighlyEpitaxial HeterostructurebyLMBE 96 4.4 QuantumDotsDevelopmentwithMolecularBeam Epitaxy 101 4.5 Summary 103 Acknowledgments 104 References 104 5 CarbonNanomaterialsand2DLayeredMaterialsDevelopmentwith ChemicalVaporDeposition 105 TaisongPan 5.1 Introduction 105 5.2 CarbonNanotubeSynthesisbyChemicalVaporDeposition 106 5.2.1 OverviewofCVDProcessofCarbonNanotubeGrowth 106 5.2.2 ControlofCarbonNanotubeStructure 108 5.2.3 TheAlignmentofCarbonNanotubeArray 110 5.3 GrapheneSynthesisbyChemicalVaporDeposition 112 5.3.1 OverviewofCVDProcessofGrapheneSynthesis 112 5.3.2 ControlofGrapheneQuality 113 5.4 MetalDichalcogenideSynthesisbyChemicalVapor Deposition 115 5.4.1 OverviewofCVDProcessofMetalDichalcogenides 115 5.4.2 GrowthControlofMetalDichalcogenidesinChemicalVapor Deposition 118 5.5 Summary 119 References 120 VIII Contents 6 NanostructuresDevelopmentwithAtomicLayerDeposition 123 HulinZhang 6.1 Introduction 123 6.2 ReactionMechanisms 125 6.2.1 ThermalALD 125 6.2.2 CatalyticALD 127 6.2.3 MetalALD 129 6.3 NanostructuresBasedonALD 131 6.3.1 NanolaminatesandNanofilms 132 6.3.2 NanostructuresasTemplates 132 6.3.3 NanostructuredModification 135 6.4 Summary 136 Acknowledgments 137 References 138 7 NanomaterialDevelopmentwithLiquid-PhaseEpitaxy 141 WeiqingYang 7.1 Introduction 141 7.2 HydrothermalMethod 142 7.2.1 DevelopmentofHydrothermalMethod 142 7.2.2 Microwave-AssistedHydrothermalMethod 143 7.2.2.1 Microwave-AssistedPreparationofNanostructuresinAqueous Solution 144 7.3 NanostructuresFabricatedUsingLPE 147 7.3.1 Core–ShellStructures 147 7.3.2 TheEpitaxialPreparationMethodsofCore–ShellStructures 148 7.3.2.1 GeneralNanochemicalApproachestoPrepareEpitaxialCore–Shell UCNPswithaSingleShellLayer 150 7.3.2.2 Layer-by-LayerApproachtoPrepareCore–MultishellUCNPswith MonolayerThicknessPrecision 153 7.3.2.3 MesoporousSilicaCoating 153 7.3.2.4 CouplingofUCNPswithPlasmonicsUsingCore–Shell Architecture 154 7.4 Summary 156 Acknowledgments 156 References 156 8 NanostructuralThinFilmDevelopmentwithChemicalSolution Deposition 159 YandaJiandYuanLin 8.1 Introduction 159 8.2 PrecursorSolutionPreparation 159 8.2.1 ChemicalStrategiesforPrecursorSolutions 160 8.2.2 Sol–GelMethod 160 8.2.3 Metal-OrganicDeposition 161 Contents IX 8.2.4 Polymer-AssistedDeposition 161 8.3 Coating 162 8.4 ThermalTreatment 163 8.5 ControloftheMicrostructuresinThinFilmsPreparedbyCSD Techniques 164 8.5.1 ThermodynamicsforCSD-DeliveredThinFilms 164 8.5.2 EpitaxialThinFilmGrowth 166 8.6 ExamplesofNanostructuralThinFilmsPreparedbyCSD Techniques 167 8.6.1 Sol–Gel-DeliveredNanostructuredMaterials 167 8.6.2 MODofNanostructuredMaterials 168 8.6.3 PAD-DeliveredNanostructuredMaterials 168 8.7 Summary 174 References 175 9 NanomaterialDevelopmentUsingInSituLiquidCellTransmission ElectronMicroscopy 179 XinChen,WangfanZhou,DebiaoXie,andHongliangCao 9.1 Introduction 179 9.2 TheTechnologicalDevelopmentofInSituLiquidCellTEM 179 9.2.1 TheAdventoftheModernInSituLiquidCell 180 9.2.2 RecentTechnologicalDevelopmentofLiquidCells 180 9.2.3 CommercialLiquidCells 183 9.3 NanomaterialDevelopmentUsingInSituLiquidCellTEM Technology 185 9.3.1 NanomaterialGrowthInducedbyElectricalBias 185 9.3.2 NanomaterialGrowthInducedbyIrradiation 187 9.3.3 NanomaterialFormationInducedbyHeating 189 9.3.4 FurtherNanomaterialDevelopmentResultsfromInSituLiquidCell TEM 190 9.4 SummaryandOutlook 191 Acknowledgments 191 References 192 10 Direct-WritingNanolithography 195 MinGao 10.1 Introduction 195 10.2 ElectronBeamLithography 195 10.3 FocusedIonBeamLithography 198 10.4 Gas-AssistedElectronandIonBeamLithography 200 10.5 SPMLithography 201 10.6 Dip-PenLithography 205 10.7 Summary 206 Acknowledgments 207 References 207 X Contents 11 3DPrintingofNanostructures 209 MinGao 11.1 Introduction 209 11.2 3DPrintingProcesses 209 11.3 Typesof3DPrinting 210 11.3.1 Stereolithography 210 11.3.2 FusedDepositionModeling 211 11.3.3 SelectiveDepositionLamination 212 11.3.4 SelectiveLaserSintering 213 11.3.5 3DInkjetPrinting 214 11.3.6 MultijetModeling 214 11.4 3DDirectLaserWritingbyMultiphotonPolymerization 214 11.5 3DPrintingApplications 217 11.5.1 MedicalApplications 217 11.5.2 IndustrialManufacturing 218 11.5.3 DailyConsumption 219 11.5.4 Limitationof3DPrintingApplications 219 11.6 Summary 219 Acknowledgments 220 References 220 12 NanostructuredThinFilmSolidOxideFuelCells 223 AlexIgnatiev,RabiEbrahim,MukhtarYeleuov,DanielFisher,XinChen, NaijuanWu,andSerekbolTokmoldin 12.1 Introduction 223 12.2 SolidOxideFuelCells 223 12.2.1 ThinFilmSolidOxideFuelCellFabrication 225 12.2.2 ThinFilmSolidOxideFuelCellTesting 231 12.2.3 ThinFilmFuelCellStackDevelopmentandTesting 234 12.3 Summary 237 Acknowledgments 237 References 237 13 NanostructuredMagneticThinFilmsandCoatings 239 GoranRasic 13.1 Introduction 239 13.2 High-FrequencyDevices 240 13.2.1 Ferromagnets 241 13.2.2 Coercivity 242 13.2.3 MagneticLosses 243 13.2.4 NanoscaleMethodsofLossReduction 244 13.2.5 ManufacturingConsiderations 244 13.2.6 CoercivityReductioninSurface-PatternedMagneticThin Films 245 13.3 MagneticInformationStorageDevices 251